Used GASONICS Aura 1000 #9105746 for sale

Manufacturer
GASONICS
Model
Aura 1000
ID: 9105746
Wafer Size: 4"-6"
Plasma ashers, 4" - 6" Option available: Dry pumps 208 V, 50 Hz, 20 A, 3Ph.
GASONICS Aura 1000 is a highly advanced etcher/asher equipment designed for precise and efficient processing of various materials in semiconductor fabrication and other high-tech industries. This equipment is known for its superior performance, reliability, and versatility, making it an essential tool for research and development as well as production environments. Aura 1000 features a state-of-the-art plasma processing technology that enables it to perform a wide range of etching and ashing processes with exceptional precision and repeatability. The system utilizes a combination of plasma gases, RF power, and temperature control to create highly reactive species that interact with the material surface, resulting in controlled removal or modification of the material. One of the key highlights of GASONICS Aura 1000 is its advanced process control capabilities. The unit is equipped with advanced monitoring and measuring tools that allow real-time monitoring of process parameters such as gas flow, pressure, temperature, RF power, and plasma density. This enables users to optimize process conditions for maximum efficiency and uniformity, leading to improved process repeatability and product quality. Moreover, Aura 1000 offers a high degree of automation and process customization options, allowing users to tailor the machine to their specific processing requirements. The tool is equipped with a user-friendly interface that enables easy programming of process recipes, adjustment of parameters, and monitoring of process performance. Additionally, the asset can be integrated with a variety of software tools for advanced data analysis and process optimization. In terms of hardware, GASONICS Aura 1000 is built with high-quality components and materials that ensure long-term reliability and stability. The model features a robust vacuum chamber, high-performance RF generator, precision gas delivery equipment, and advanced plasma source that enable high-throughput processing with minimal downtime. Aura 1000 is capable of processing a wide range of substrates, including silicon wafers, III-V compounds, ceramics, glass, and polymers. The system supports various etching and ashing processes, such as photoresist stripping, oxide etching, metal etching, dielectric etching, and more. With its versatile capabilities and flexible process options, GASONICS Aura 1000 is suitable for a wide range of applications in the semiconductor, MEMS, LED, and other high-tech industries. Overall, Aura 1000 is a top-of-the-line etcher/asher unit that offers unmatched performance, reliability, and flexibility for demanding process applications. With its advanced technology, process control features, and customizable options, GASONICS Aura 1000 is a valuable tool for achieving high-quality results in semiconductor processing and beyond.
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