Used GASONICS / NOVELLUS Aura 1000 #293811105 for sale

GASONICS / NOVELLUS Aura 1000 is a highly advanced and versatile plasma etcher/asher equipment utilized in the semiconductor industry for precise material removal and cleaning processes. This tool combines both etching and ashing functionalities in one platform, making it a cost-effective and space-saving solution for semiconductor manufacturers. At the heart of GASONICS Aura 1000 is its high-performance plasma processing chamber, which is designed to generate a low-pressure, high-density plasma environment. This plasma chamber is equipped with state-of-the-art radio frequency (RF) power sources and gas delivery systems to create and sustain the plasma necessary for etching and ashing processes. NOVELLUS Aura 1000 offers a wide range of process capabilities, including isotropic and anisotropic etching, as well as precise ashing of photoresist and other organic materials. This system provides excellent process control and repeatability, allowing for the customization of process parameters such as gas flow rates, pressure, temperature, and RF power to achieve the desired etch rates and selectivity. One key feature of Aura 1000 is its advanced endpoint detection unit, which accurately monitors the progress of the etching/ashing process in real-time. By analyzing the optical emission spectra or other relevant signals, the machine can precisely determine when the desired endpoint has been reached, ensuring precise process control and minimizing over-etching or under-etching. GASONICS / NOVELLUS Aura 1000 is also equipped with advanced wafer handling capabilities, allowing for the processing of various wafer sizes and types. The tool is designed to accommodate both single-wafer and batch processing, offering flexibility and throughput optimization for different manufacturing needs. Furthermore, GASONICS Aura 1000 incorporates innovative gas delivery and mixing systems, enabling the precise control of process gases and reactants for optimal etching/ashing performance. The asset can be configured with a variety of gas sources, including fluorine-based, chlorine-based, and oxygen-based chemistries, to meet specific process requirements and achieve the desired etch selectivity and profile control. In terms of model control and automation, NOVELLUS Aura 1000 is equipped with a user-friendly interface and advanced software capabilities for recipe management, data logging, and process monitoring. The equipment allows for the easy programming of process recipes and parameter settings, as well as the integration with factory automation systems for seamless wafer tracking and scheduling. Overall, Aura 1000 is a highly sophisticated and reliable plasma etcher/asher system that offers superior process performance, flexibility, and control for semiconductor manufacturers. With its advanced capabilities, precise process control, and efficient wafer handling, GASONICS / NOVELLUS Aura 1000 is an essential tool for achieving high-quality and high-yield semiconductor device fabrication.