Used GASONICS / NOVELLUS Aura 1000 #9284336 for sale

GASONICS / NOVELLUS Aura 1000 is a high-performance etcher/asher developed for semiconductor manufacturing processes. It is designed to be both cost-effective and reliable, providing a reliable and precise platform for processing substrates in a variety of processes. GASONICS Aura 1000 features patented Auto-Polarity Conversion (APC) technology for fast and accurate patterning. This equipment enables greater accuracy and repeatability compared to other systems, and is capable of etching systems with high aspect ratios and different substrates. This etcher uses ALD, Plasma Clean, and Chemical Vapor Deposition (CVD) processes to Pattern Select Process, Vertical Alignment Shaped Features, and True Step-Height Restoration. NOVELLUS Aura 1000 utilizes a Starring Centricity Substrate Transfer System for precise substrate handling and positioning. This unit provides precise loading, positioning, and rotation of substrates. Other features include Auto-Leveling, Auto-Wafer Mapping, S-Stage Expansion, and Scaled Processing Throughput. In addition, this etcher also features integrated substrate cleaning with ultrasonic and wafer cleaning technologies. This provides efficient and precise cleaning of the substrate surface. Additionally, Aura 1000's plasma machine uses low particle filtration, reducing the build-up of particles that can potentially harm the device. GASONICS / NOVELLUS Aura 1000 comes with a highly integrated operation tool, which offers real-time monitoring of temperatures, pressures, and other process parameters. There are also a variety of process recipes, profiles, and settings that provide operator flexibility to customize the etching and ashing process. This etcher is easy to use and maintain, with a user-friendly graphical interface, and comprehensive built-in documentation. Overall, GASONICS Aura 1000 is an advanced, reliable and cost-effective etcher for precision semiconductor manufacturing. Its technologically advanced design, integrated process and substrate handling, and careful cleaning procedures provide an efficient and precise etching and ashing asset for today's advanced semiconductor devices.