Used GASONICS / NOVELLUS Aura 2000LL #293749487 for sale

GASONICS / NOVELLUS Aura 2000LL is a next-generation plasma etcher/asher designed for high-volume, high-precision etching and ashing. It combines GASONICS patented plasma processing technology with NOVELLUS sophisticated ultra-low-load (ULL) optimized chamber for superior etch and ash performance. GASONICS Aura 2000LL uses a patented power generator design to create precise plasma conditions reliable across batches, while adjustable biasing and RF power levels allow for precise control of etch and ash processes. Its ULL chamber design is optimized for higher throughput and lower particle levels, providing the performance needed to maintain device yield and uniformity. NOVELLUS AURA 2000 LL is capable of high etch rates and selective etch rates, as well as control of etch depth and over etching for precise patterning of high-k and polysilicon. The improved performance of NOVELLUS Aura 2000LL allows for higher load processes that can be completed in fewer process steps, saving time and cost in device fabrication. The system has been designed for easy integration into existing process flows and can be used to etch and as lithium and cobalt metals, silicon (poly and high-k), dielectrics, and various other metals and compounds. The system boasts a high throughput of up to 22 wafers per hour and can achieve high aspects ratios, making it a great choice for technology applications requiring precise patterning of narrow features. Aura 2000LL is also extremely reliable, with consistent etch quality monitorable with its onboard diagnostic system, allowing for process optimization and repeatable results.