Used GASONICS / NOVELLUS Iridia #293659761 for sale
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ID: 293659761
Wafer Size: 8"
Vintage: 2005
Asher, 8"
Dual chamber
Gas supply:
Left and right chamber gas box:
Gas name / Range / Connection size
CF4 / 200 SCCM / 1/4" VAC Male
N2 / 500 SCCM / 1/4" VAC Male
O2 / 500 SCCM / 1/4" VAC Male
HE / 2 SLPM / 1/4" VAC Male
NF3 / 20 cc / 1/4" VAC Male
O2 / 50 SCCM / 1/4" VAC Male
Purge N2 / - / 1/4" VAC Male
Cassette unit:
Cluster PCM
YASKAWA XU-CM 4730 Robot controller
Chamber unit:
(2) Left and right PCM
(2) 95-3798 MISC Controllers
(2) 02-168304-00 Gas controllers
(2) 95-3154 M/W Controllers
(2) Lamp controllers
(2) EUROTHERM 818S Temperature controllers
(2) NIKON M680 Temperature controllers
(2) ENI ACG-6B RF Generators
(2) MKS MWH-5 RF Matchers
(2) MKS MWH-R RF Matcher boxes
(2) MKS 600 Series Pressure controllers
(2) MKS 638B-2-50-2 Pressure valves
Chambers:
(4) PCW QC6 Connectors
(2) VAC ISO 80
(2) CDA 3/8" SWG Male
Missing parts:
YASKAWA XU-RCM 4700 Robot
(2) ASTEX D13765 M/W Generators
Power supply:
208 V, 50/60 Hz, 150 A, 3 Phase, 5 Wires
2005 vintage.
GASONICS / NOVELLUS Iridia is an advanced etching and ashing equipment used in the semiconductor manufacturing industry. It is a fully automated system that provides high-precision processing of photoresists, metals, and other materials used in the production of semiconductor chips. The unit incorporates the industry's latest technology for multi-mode plasma etching and CVD processes, which enable faster processing of intricate patterns and tighter dimensional tolerances in all levels of chip development. GASONICS Iridia machine features a number of innovations that help maximize semiconductor chip yields and increase throughput. It uses a single-source etch/ash process, incorporating key etch and deposition processes in one machine to cut down on costly set-up changes needed for multiple-stage processing. It also features direct sampling in-situ diagnostic tools with real-time digital feedback for maximum process control and improved tool uptime, plus auto load chamber balance capability and improved wafer uniformity for finer feature control. NOVELLUS Iridia asset provides multiple etching configurations for optimizing feature resolution and selectivity. Its automated systems enable process optimization and faster ramp-up times for refining device structures, and its optional loadlock model provides quick substrate introduction and removal for increased process stability and throughput. The equipment also allows for customization of substrate configuration and loading, allowing users to maximize production flexibility and tailor the system to individual needs. Iridia is designed for optimal stability, throughput, and versatility, giving semiconductor manufacturers the power to push the boundaries of thin-film technologies. The unit provides capabilities that enable the processing of complex three-dimensional structures and sub-micron geometries in the most demanding semiconductor environments. All of this helps to increase yields and improve process stability, allowing for the production of higher-quality chips in shorter runs.
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