Used GASONICS / NOVELLUS L 3300 #9243661 for sale

GASONICS / NOVELLUS L 3300
ID: 9243661
Wafer Size: 8"
Vintage: 1992
Asher, 8" 1992 vintage.
GASONICS / NOVELLUS L 3300 is a fully automated etcher designed to produce exceptionally high-quality and accurate features in substrates. This etcher provides a high-pressure, high-density plasma environment capable of rapidly etching through a wide range of materials. The integrated end point detection equipment ensures ultra-precise etch profiles, improving yield and productivity. The advanced control and automation of this unit helps to ensure repeatable process results. This is accomplished through a variety of features such as tight process control, inline diagnostics, auto recipe management, and a wide range of plasma recipes. Additionally, this system provides a highly efficient heat source for substrate heating and cooling. For heating, an in-situ quartz lamp is used to maintain a constant temperature during etching, with the heat being evenly distributed across the target substrate. GASONICS L 3300 uses a Pulsed Plasma Power Source (PPPS) to generate a precise and uniform plasma that is tailored to materials of different types and thicknesses. The interface between the PPPS and the substrate is designed to maximize yield and throughput. The PPPS provides adjustable pulse width waveforms and self-adaptive plasma waveforms to optimize process control. In-situ gases are also managed within the chamber to ensure optimal process repeatability. Specifically, the etcher offers dynamic flow control of oxygen, Ar/CF4/CHF3, SiCl4, and SF6 chemicals. The process is controlled via a vacuum-tight chamber with adjustable-height arc copper shower head and fiber optic shower head for improved process uniformity. NOVELLUS L 3300 is capable of processing substrates up to 8 inches (203 mm) in size. This allows for quick turnaround times, as substrates can be processed in a short period of time and do not require additional passes or steps. The etcher is easy to use, with a user-friendly interface for easy recipe generation, unit operation, and process monitoring. The machine also features an integrated diagnostic tool that helps to ensure process repeatability. Overall, L 3300 is a high-quality, reliable etching asset that is designed to provide accurate, precise etching capabilities. With its high-pressure, high-density plasma and high-efficiency heating/cooling capabilities, it is an ideal choice for many different industries. Its flexibility and easy-to-use features make it a great choice for anyone who needs to accurately etch substrates quickly and reliably.
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