Used GASONICS / NOVELLUS L 3500 #9235159 for sale

GASONICS / NOVELLUS L 3500 is an advanced etcher/asher, designed for high throughput, rapid deposition, and precise atomic layer deposition. It is capable of achieving 3-5 nanometer precision at high throughput rates. The system is equipped with a vacuum-based process chamber, a high-power RF plasma source, and an in-situ wafer inspection device. The vacuum based process chamber provides an ultra-high vacuum environment for processing substrates. It is equipped with a gas distribution system that allows for precise control of the process atmosphere, enabling a range of materials to be etched or ashed. The process chamber also includes active pumping to maintain a vacuum level of 10-6 Torr. The RF plasma source is capable of generating very high powered plasmas at a range of power levels. This enables a wide range of materials to be etched or ashed, from metals to dielectrics. The system also includes precision control of both the power and frequency of the plasma, allowing the operator to match the process to the desired application. The in-situ wafer inspection device allows for real-time inspection of the etched or ashed surface. This ensures consistent results over substrates of different sizes and materials. The device includes a variety of sensors to measure parameters such as temperature, pressure, and GASONICS L 3500 also includes software for the manipulation and management of recipes and parameters to ensure consistent process results. Overall, NOVELLUS L3500 is a powerful, precise, and high-throughput etcher/asher that is ideal for a variety of deposition and etch processes. It is highly reliable, easy to operate, and is designed to process a range of materials with high precision and throughput.