Used GASONICS / NOVELLUS L 3510 #293586002 for sale

GASONICS / NOVELLUS L 3510 is a high-precision Advanced Omnidirectional and Selective Inductively Coupled Plasma (ICP) etcher or asher. It is a large-area dry etching tool that is specifically designed to deliver superior performance in the selective and omnidirectional etching of substrates made of various materials. It is also used in processing a wide range of materials and films including silicon, gallium antimonide, and indium phosphide. GASONICS L 3510 is considered one of the fastest etchers in its class. It utilizes a inductively coupled plasma generated via a radio frequency (RF) generator. This allows for efficient and uniform etching over the entire wafer. The tool features a unique gas-mist carrying hood that evenly distributes the etching gas over the entire surface of the wafer substrates. Additionally, NOVELLUS L 3510 utilizes a hybrid ion subassembly that simultaneously directs an ion beam and an argon-based plasma over the wafer's surface for highly flexible etching. L 3510 is outfitted with advanced processes and computing systems to monitor and control the etching process in real-time. The main control panel features both a front-end user interface and a back-end system. The front-end user interface uses graphical user interface (GUI) technology to display various process parameters and allow the user to adjust settings. The back-end system repeatedly measures and logs critical process data to optimize recipes and ensure a highly repeatable, consistent etching process. GASONICS / NOVELLUS L 3510 features multiple ICP sources and a built-in wafer cassette loading system for rapid wafer processing. Furthermore, the tool can be automated for in-line production applications. An independent data concentrator can forward all process data to a host computer for remote monitoring and operation. This allows for greater process control and flexibility, as well as improved operation efficiency. GASONICS L 3510 is a versatile, advanced etcher and asher that offers excellent wafer-level patterning and selective etching capabilities. Designed to deliver superior performance, this tool enables users to achieve high etch uniformity and extremely small feature size. As such, it is an ideal tool for fabrication in the semiconductor, solar cell, and flat panel display industries.