Used GASONICS / NOVELLUS L 3510 #293595737 for sale

GASONICS / NOVELLUS L 3510
ID: 293595737
Ashers.
GASONICS / NOVELLUS L 3510 etcher/asher is an advanced, high-throughput dry etching equipment with higher process control and increased productivity. The system has been designed for a wide range of applications, such as silicon, nitride, metals, and organic materials. The reliability of GASONICS L 3510 unit is based on the comprehensive experience and technologies of GASONICS and NOVELLUS. NOVELLUS L 3510 etcher/asher relies on proven etching technologies, including an inductively coupled plasma (ICP) source and an excimer (deep UV) laser, to etch and clean substrates. It has a process chamber that provides sufficient flexibility to etch different materials and has a built-in vacuum machine that creates an ultra-high vacuum environment. The etcher/asher is capable of etching through thin films of materials, such as silicon or nitride, with a high-throughput rate. The in-situ capacitance-voltage (CV) monitor allows for real-time process control to ensure uniform etching. In addition, the platform's advanced temperature control and gas distribution tool allow for precise temperature and gas distribution. L 3510 etcher/asher is supported by a suite of software, enabling users to select and optimize recipes quickly, providing an enhanced user experience. The user can create recipes and modify parameters according to the application's requirements. The Graphical User Interface (GUI) interface is user-friendly and allows for an intuitive operation. GASONICS / NOVELLUS L 3510 etcher/asher is an excellent platform for a variety of applications in electronics, photonics and semiconductor industries. It has PLC control which provides high accuracy and repeatability of processes, and the Dielectric Constant Monitor (DFM) and Vacuum monitor (VTM) systems offer excellent process control and monitoring capabilities. The asset is well-suited for various wafer cleaning and etching applications, such as removal of thermally grown oxide and shallow etching of metals. The model also offers low contamination during etching, which is beneficial for sensitive material such as aluminum or silver. Thanks to its modular design, the equipment can be easily upgraded and modified to meet the changing needs of customers.
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