Used GASONICS / NOVELLUS L 3510 #9144778 for sale

ID: 9144778
Wafer Size: 6"
Asher, 6" Robot model: Koro 5100 Hitachi microwave unit.
GASONICS / NOVELLUS L 3510 Asher is a high-end automated etching and asher semiconductor manufacturing equipment designed for medium to high throughput production applications. The system is designed to pattern photoresist and other dry-film layers in high-density circuit features on semiconductor substrates. It is capable of etching features down to 0.20 µm, with high precision and uniformity. The unit includes two process chambers with modular design, enabling maximum plenum and temperature uniformity. Armed with state of the art plasma ignition, the chambers can be tailored to specific customer needs. Special etching gases can be introduced by the Mixed-Gas Source (MGS) machine, allowing for multi-step processes with ultra-fine etching. Temperature control is achieved in the process chambers with precision control in the range of 25 to 400°C. The tool comes with a high-speed transfer asset and is integrated with GASONICS proprietary 'Flexible Processing Modules', enabling the user to choose the most suitable process for their application. It also integrates a motorized substrate handler, which allows for easy loading and unloading of substrates. To maximize productivity and protect substrates from contamination, GASONICS L 3510 features a sophisticated automated substrate handling model, with optional inert gas integration for the protection of sensitive materials. The equipment comes with a full range of process control features, such as automatic defect detection, end-point sensing, process parameter monitoring, and process optimization capabilities. It also has built-in diagnostic capabilities for efficient process stability and quality control. The system is compatible with a wide range of wafer sizes, up to 12-inch. It also supports up to 20 substrates per batch, allowing for efficient production throughput. Overall, NOVELLUS L 3510 is a high-performance etcher and asher capable of producing fine-resolution etched features with excellent uniformity and throughput. Its modular design and advanced process control features make it an ideal choice for medium to high throughput production applications.
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