Used GASONICS / NOVELLUS L 3510 #9259241 for sale

GASONICS / NOVELLUS L 3510 is a high-performance chemical vapor deposition (CVD) etcher/asher designed for shallow trench isolation (STI) applications. It features improved deposition uniformity at sub-quarter micron dimensions and provides both high etch rates and low defectivity. GASONICS L 3510 is a single-chamber tool with a rotatable chuck for semiconductor wafer processing and features an advanced, ultra-high vacuum (UHV) chamber design. NOVELLUS L 3510 is equipped with variable frequency RF sources, two independent plasmajets, a configurable Multi-Probe Loading System (MPLS), and a high-speed internal laser interferometer for spatial position control and accurate fine tuning. The highly automated controller in L 3510 supplies precise gas flow rate and temperature control and offers comprehensive process diagnostic capabilities to ensure efficient processing of wafers. GASONICS / NOVELLUS L 3510 has the capabilities to precisely deliver process gases to the substrate, and its improved accuracy and positional control allow it to operate at lower pressure and temperature ranges. The chamber design enables processing of up to 200 mm wafers with as low as 500 angstrom variations in feature size and 0.25 nm uniformity across the entire substrate surface for large area devices. GASONICS L 3510 provides several features that provide the highest etch selectivity and improved performance. It features a parallel backside strip source, an improved bottom strip source, and improved satellite source. This allows for better repeatability and higher throughput. A sophisticated cycle computer with a graphical user interface (GUI) provides the ultimate convenience and support for recipe creation and management. Overall, NOVELLUS L 3510 is an advanced etcher/asher that provides a high level of performance and accuracy. It is capable of depositing films on substrates with very high throughput and low defectivity and is ideally suited for STI-based applications. It is an effective way to increase accuracy and throughput while maintaining the highest yield and the best film quality.