Used GASONICS / NOVELLUS L 3510 #9299014 for sale

GASONICS / NOVELLUS L 3510
ID: 9299014
Wafer Size: 6"
Asher, 6".
GASONICS / NOVELLUS L 3510 is an advanced etcher/asher used for semiconductor manufacturing processes. It is specifically designed for high-throughput applications requiring repeated capacitively coupled plasma (CCP) etch cycles. GASONICS L 3510 comes with a high-performance chamber design and two-stage gas delivery that allows it to offer improved throughput rates. NOVELLUS L 3510 etcher chamber is constructed with materials that are low temperature compatible and inert to the high temperature plasma generated during processing. This combination of materials ensures the highest etch uniformity, leading to improved device performance. Additionally, a large capacity upper electrostaticChuck and large cycling bellows allow for efficient plasma processing. The two-stage gas delivery system is made up of two separate delivery tubes that allow the etcher to deliver different gases to different areas of the chamber during plasma processing. This allows for more precise control over the process, improving etch uniformity. L 3510 offers advanced automation options with several programmable features including multi-planar etch processing, multi-gas emissions, and independent drain cycles for each of the two chambers. It also features a large touch-screen monitor that provides real-time information about the process and a remote control interface allowing a technician to adjust process parameters from a remote workstation. For added safety, GASONICS / NOVELLUS L 3510 has an integrated plasma detection system that can detect when the process has gone out of spec and will shut down the system immediately. This feature ensures that the process is safe and will not cause damage to the wafer or the device. Overall, GASONICS L 3510 is an advanced etcher/asher that provides precise control of the etching process, allowing for higher throughput rates and improved device performance. It is ideal for applications where high etch uniformity is critical and offers enhanced automation with programmable features.
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