Used GASONICS / NOVELLUS L 3510 #9299015 for sale

GASONICS / NOVELLUS L 3510
ID: 9299015
Wafer Size: 6"
Asher, 6".
GASONICS / NOVELLUS L 3510 is a highly advanced etcher/asher equipment designed for the demanding production needs of the semiconductor industry. The system features the Q-200 High-Speed Q-Switch, which provides exceptional uniformity and high deposition rates up to 200nm/sec. The unit also features gas operating pressures up to 75 millibar, allowing for efficient throughput with faster process cycles. Furthermore, the machine is capable of exposing large areas at once due to its X-Y scanning mount, up to a maximum of 22 watts/cm2. GASONICS L 3510 provides process stability with its acclaimed Open-loop Sense-and-Match™ control, which allows for real-time adjustment of critical parameters during the etch process. This gives the user the ability to fine-tune the etch process to ensure the recipe is optimized for the best possible end-product. The tool also features intelligent automation to minimize operator involvement in repetitive manual processes. NOVELLUS L 3510 is also engineered for safety, boasting a Class M shielding for minimum risk of contamination and noise reduction. An additional safety feature is the periscope view that allows for observation of the interior of the chamber. This asset is also equipped with GASONICS proprietary µV™ model that measures and monitors the plasma potential in real time. This makes the plasma equipment safe from potential shorts caused by excessive voltage buildup in the process chamber. To ensure the best performance and maximum throughput, L 3510 is fitted with the innovative P-Integrated Cradle that allows finer substrate alignment and reduced thermal gradients across the substrate. This is an important feature when etching high-aspect ratio features that could be damaged by heat buildup. The system also features uniform shielding across the X and Y axes, as well as isothermalized isolated RF/DC components. GASONICS / NOVELLUS L 3510 is an advanced and highly capable etcher/asher unit, designed with the needs of the semiconductor industry in mind. It provides the user with a high degree of process control, excellent performance, and unprecedented safety. It is an ideal machine for a wide range of processes ranging from high-aspect ratio etching to speciality substrates and processes.
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