Used GASONICS / NOVELLUS L 3510 #9374853 for sale

GASONICS / NOVELLUS L 3510 is an advanced etch/ash equipment for semiconductor device manufacturing. It offers high throughput, superior deposition uniformity, and superior pattern fidelity compared to other etch/ash systems. With its high through-put, the system can support production-level throughput, while providing flexibility and scalability up to 6-inch wafers. The process commences in the Precursor module, which is designed to pre-treat devices prior to the etching or ashing step. The module houses a large, single dose source of various chemical precursors including chlorine, nitrogen, and fluorine. This combination of precursors results in denser layer deposits, improved patterning, and reduced processing time. In the Etch/Ash module the wafer is placed into a process chamber that contains the etch/ash source and is exposed to a combination of chemicals. A series of back-to-back pulse shower steps ensures even deposition and etching, while the high-speed reactive ion etching process etches the device pattern. The Plasma Source module utilizes a high-frequency generator to create a plasma, which supplies energy to the desired material to enable etching and ashing. The plasma source also supports improved dielectric coverage, higher aspect ratios, and faster processing times compared to wet etch/ash systems. Additionally, GASONICS L 3510 comes equipped with a multifunctional Log Book for real-time monitoring, trend display, and log file retrieval. This allows users to monitor all process parameters, as well as enabling the unit to complete a full sweep of the process chamber prior to every run. This ensures consistency, accuracy, and reliability. NOVELLUS L 3510 is a versatile and powerful etch/ash machine, designed to provide-time- and cost-effective processing of wafers up to 6-inch. Its combination of high throughput and superior pattern fidelity makes it an excellent choice for semiconductor device manufacturing.