Used GASONICS / NOVELLUS L 3510 #9392635 for sale

GASONICS / NOVELLUS L 3510 is an advanced etcher/asher equipment that combines plasma, chemical and physical etch processes in a single integrated tool. This advanced system is suitable for a wide range of applications, from advanced interconnects to compound semiconductor devices. The etcher/asher features an integrated robotic wafer handling unit with four independent chambers, each with its own gas and process control. The machine also offers an optional multi-step process, allowing the user to define up to eight recipes in each chamber. This feature allows the etcher/asher to process multiple substrates in one cycle, increasing throughput and user flexibility. GASONICS L 3510 utilizes both thermal and chemical etch technologies. Thermal etching is accomplished using a reactive ion etcher/plasma etcher, which is capable of generating plasma conditions up to 100 watts. The tool also features an adjustable baking process to help optimize substrate surface preparation. The plasma etcher is complemented by a chemical etch tool, which utilizes a variety of chemical species to remove material. The asset is designed to provide high resolution critical dimension control, with a photomask imaging accuracy down to less than 0.5µm. This is accomplished by coupling an imaging model with a gallium arsenide/nitride/arsenide-based deposition unit. Additionally, the equipment can handle substrates up to 250mm in diameter (8" wafer) and has an internal vacuum flange with process pressures from 1 mtorr to 100 mtorr. NOVELLUS L 3510 is a versatile and compact system, perfect for fabricating fine-geometry μVLSI circuits, photonic and microwave devices, interconnects and optical components. This combination etcher/asher unit provides precision surface processing and etching and ashing of diverse substrates with high throughput and great repeatability. Its superior reliability and performance make L 3510 an ideal tool for advanced etch and ashing applications.