Used GASONICS / NOVELLUS L 3510 #9396061 for sale

The GatanGASONICS / NOVELLUS L 3510 is a state-of-the-art etcher/asher equipment designed for semiconductor manufacturing. Utilizing Thomson scattering and a high-energy source, GASONICS L 3510 is capable of precision etching and ashing of photoresist and other materials to the sub-micron level. The system is composed of an ion source column, an ion optical column, an electrostatic lens, an ion energy multiplier, and an ion energy sensor. Additionally, a range of in-chamber optics and process technology are controlled by a dedicated C ontrol P rocessor. The advanced analytical unit on NOVELLUS L 3510 incorporates a high-leave surface analytical capability that allows for sensitive material removal and passivation that supports advanced optical material integrity. One of the most notable features of L 3510 is the adjustable gas injection machine that permits the selection of two levels of energetic particle-optima etching and ashing, thus allowing for ultrafine tuning of the results efficaciously. GASONICS / NOVELLUS L 3510 accepts multiple wafer types, such as silicon wafers, arsenic-based wafers, and quartz wafers, for etching and passivation. The analysis suite included on GASONICS L 3510 also permits users to monitor and measure the total ion output, uniformity of ion energy, uniformity of ion beam position, chamber pressure, and other process variables in real-time. With the optional ConsuL Turbo EC multi chamber tool, several NOVELLUS L 3510 etcher/asher systems can be linked, enabling automated treatment and analysis of multiple wafers. L 3510 also boasts excellent data-handling capabilities and communication interface systems. Data analysis, such as depth profile, is enabled with the built-in Graphical User Interface (GUI). Overall, the GatanGASONICS / NOVELLUS L 3510 is a performance oriented, reliable, and cost-effective etcher and asher for modern semiconductor fabrication.