Used GASONICS / NOVELLUS PEP 3010 #9230241 for sale

GASONICS / NOVELLUS PEP 3010 is an etcher / asher created by GASONICS Systems for the precision etching of substrates used in the production of semiconductor materials. The machine employs a dual-beam imaging equipment that combines a CO2 laser with an electron-beam (e-beam) lithography system. This combination allows for the imaging of circular, square, and rectangular substrates with greater resolution and precision than competing etchers. GASONICS PEP 3010 processes a variety of substrates, including gallium arsenide (GaAs), silicon, indium phosphide (INP), germanium and other compound semiconductor materials. The etcher is designed to process substrates with a flat surface geometry and a thickness ranging from 0.1mm to 0.25mm (1/10th to one-quarter of a millimeter). It also processes a wide range of etch rates, reproducible across a range of depths, and accommodates the full range of mask sizes and substrates available in the semiconductor industry. The etcher contains two sets of specialized components. The first set houses the imaging unit, which consists of a laser and e-beam lithography tool. The laser module possesses a mirror, beam expander, and galvanometer mirror, which are used to focus the laser beam and accurately target the desired area of the substrate. The second set contains the gas-flow components, which include a gas plenum chamber, a set of solenoid valves, and a conductance-controlled shower head. These components are used to precisely regulate the flow of etching gases so as to obtain the desired etch rate, depth, and profile. NOVELLUS PEP 3010 can be pre-programmed with recipes for different etching tasks by a Human-Machine Interface (HMI). The recipes allow the user to program customized etching parameters, such as gas flow rate, gas pressure and temperature, voltage, and pulse duration. The machine also features a set of alarms and an auto-recovery machine that alert the user to any problems that may arise during the etching process. PEP 3010 works in tandem with several peripheral components, such as the jet etcher and automated substrate loader/ unloader. The jet etcher further increases the accuracy of the etching process by utilizing a jet of reactive gas, in combination with inert gas, to direct etches at high speed and high resolution. The automated substrate loader/unloader transports substrates between the etcher and the jet etcher, increasing the efficiency and throughput of the etching process. GASONICS / NOVELLUS PEP 3010 is an ideal tool for the production of semiconductor material. Its relatively small size, high speed and resolution, and advanced recipes allow for maximum efficiency and precision of etching. Furthermore, the machine is designed to be used in a range of industrial environments, thereby making it an extremely versatile, yet powerful, etching tool.