Used GASONICS / NOVELLUS PEP 3510 Iridia #293658056 for sale
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ID: 293658056
Wafer Size: 8"
Asher, 8"
Dual chamber
Component configuration:
Cassette unit:
Cluster PCM
YASKAYA XU-CM 4730 Robot controller
Chamber unit:
(2) Lift and right PCM
(2) MISC Controllers
(2) Gas controllers
(2) M/W Controllers
(2) Lamp controllers
(2) EUROTHREM 818S Temperature controllers
(2) NIKON M680 Temperature controllers
ASTEK D13765 M/W Generator (Right side)
(2) ENI ACG-6B RF Generators
(2) MKS MWH-5 RF Matchers
(2) MKS MWH-R RF Matcher boxes
(2) MKS 600 Series Pressure controllers
(2) MKS 638B-2-50-2 Pressure valves.
Gas supply:
Gas name / Range / Size
CF4 / 200 mm / 1/4" VAC
N2 / 500 mm / 1/4" VAC
O2 / 500 mm / 1/4" VAC
HE / 2 SLPM / 1/4" VAC
NF3 / 20 CC / 1/4" VAC
O2 / 50 SCCM / 1/4" VAC
Purge N2 / - / 1/4" VAC
Utility description:
(4) QC6 Connectors
(2) ISO 80 Chambers
(2) 3/8" SWG Male chambers
Misssing parts:
YASKAYA XU-RCM 4700
ASTEK D13765 M/W Generator (Left side)
Power supply: 208 V, 5-Wire, 150 A, 50/60 Hz, 3 Phase.
GASONICS / NOVELLUS PEP 3510 Iridia is an advanced etcher/asher equipment designed for advanced semiconductor applications. It is a PECVD (Plasma-Enhanced Chemical Vapor Deposition) system equipped with a 180-watt DC plasma source. It is equipped with a source power control unit that can go from 0-180 watts in 0.1 watt increments, allowing precise control of the etching/ashing process. The machine also has a substrate rotation capability from 5-1000 rotations per minute (rpm) and is controlled by a CCD camera for accurate substrate positioning. GASONICS PEP 3510 Iridia is designed with a quartz etching/ashing chamber which uses up to two or four gases for etching and ashing. The quartz ensures that the etching and ashing processes are not contaminated by contaminants such as metals that may break down during the process. NOVELLUS PEP 3510 Iridia also has a gas delivery unit which enables a wide range of gas mixtures to be delivered into the etching/ashing chamber. This enables the user to fine-tune the opening and closing times of the gate valves which control the etching and ashing processes. PEP 3510 Iridia has a high-purity ion source, with 90 degrees angle and up to 200 watts power. It is capable of producing a wide range of ions and radicals which can be used for etching and ashing. GASONICS / NOVELLUS PEP 3510 Iridia has a multi-level gas control machine which enables precise levels of etching/ashing and enables a wide range of process parameters to be set, such as etching/ashing duration, pressure, temperature, and flow rate. Finally, GASONICS PEP 3510 Iridia is equipped with a plasma monitor and is able to measure gas concentrations in real-time. The monitor also enables the user to view the plasma waves in real-time to insure optimal process conditions. In conclusion, NOVELLUS PEP 3510 Iridia is a high-end etcher/asher tool designed for precise, controlled etching and ashing of advanced semiconductor materials. Its advanced features give users control over process parameters as well as enabling them to monitor the processes in real-time, making it an ideal tool for etching/ashing operations.
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