Used GASONICS / NOVELLUS PEP 3510 Iridia #293752827 for sale

GASONICS / NOVELLUS PEP 3510 Iridia
ID: 293752827
Wafer Size: 6"
Asher, 6" Dual chamber Component configuration: Cassette unit: Cluster PCM YASKAYA XU-CM 4730 Robot controller Chamber unit: (2) Lift and right PCM (2) MISC Controllers (2) Gas controllers (2) M/W Controllers (2) Lamp controllers (2) EUROTHREM 818S Temperature controllers (2) NIKON M680 Temperature controllers (2) ASTEK D13765 M/W Generator (Right side) (2) ENI ACG-6B RF Generators (2) MKS MWH-5 RF Matchers (2) MKS MWH-R RF Matcher boxes (2) MKS 600 Series Pressure controllers (2) MKS 638B-2-50-2 Pressure valves Gas supply: Gas name / Range / Size CF4 / 200 mm / 1/4" VAC N2 / 500 mm / 1/4" VAC O2 / 500 mm / 1/4" VAC HE / 2 SLPM / 1/4" VAC NF3 / 20 CC / 1/4" VAC O2 / 50 SCCM / 1/4" VAC Purge N2 / - / 1/4" VAC Utility description: Name / Description / Unit Power (AC) / ø3, 208V, 5wire, 150A, 50/60 Hz / Power Box PCW / QC6 Connector, 4EA / Chamber VAC / ISO 80, 2EA / Chamber CDA / 3 / 8" SWG Male, 2EA / Chamber.
GASONICS / NOVELLUS PEP 3510 Iridia is a highly advanced and versatile etcher/asher equipment used in semiconductor manufacturing processes for precise and uniform removal of thin films and residues on substrates. Built on a robust platform, this tool is designed to deliver exceptional performance, reliability, and process control for high-volume production environments. The system features innovative technologies and capabilities that make it suitable for a wide range of applications in the semiconductor industry. At the core of GASONICS PEP 3510 Iridia is its advanced plasma etching and ashing capabilities, which enable precise control over etching rates, selectivity, and uniformity across different materials and structures. The unit is equipped with a high-density plasma source that generates a reactive plasma, allowing for efficient and selective removal of material layers from substrates. This plasma source, coupled with advanced process chamber design and gas delivery systems, ensures optimal process performance and repeatability. NOVELLUS PEP 3510 Iridia offers a range of process gases and chemistries, giving users flexibility to tailor etching and ashing processes to meet specific requirements. This flexibility is crucial for addressing the diverse materials and structures encountered in semiconductor fabrication, such as silicon, oxides, nitrides, metals, and polysilicon. The machine's gas delivery tool is precisely controlled to maintain the desired process conditions and facilitate the formation of plasma species essential for material removal. One of the key strengths of PEP 3510 Iridia is its advanced process monitoring and control capabilities. The asset is equipped with real-time process monitoring sensors that enable in-situ endpoint detection, which is essential for achieving precise process control and ensuring consistent etching/ashing results. Additionally, the model features advanced hardware and software algorithms for process optimization, allowing for the adjustment of critical parameters in real-time to achieve the desired etch profile and endpoint. GASONICS / NOVELLUS PEP 3510 Iridia is designed for high-throughput processing, with features such as rapid gas switching, fast pump down times, and efficient wafer handling capabilities. These features contribute to increased productivity and reduced cycle times, making the equipment ideal for high-volume manufacturing environments where process throughput is a critical factor. The system is also designed for ease of maintenance and serviceability, ensuring minimal downtime and operational costs. In summary, GASONICS PEP 3510 Iridia is a state-of-the-art etcher/asher unit with advanced plasma processing capabilities, process monitoring and control features, and high-throughput performance. It is a versatile tool that can address a wide range of semiconductor manufacturing applications, providing users with the precision, reliability, and efficiency required for producing advanced semiconductor devices. Whether etching thin films, removing residues, or performing critical process steps in semiconductor fabrication, NOVELLUS PEP 3510 Iridia is a leading solution for achieving high-quality and uniform results.
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