Used GASONICS PEP Iridia #9293817 for sale

GASONICS PEP Iridia is a high-precision etcher/asher used to fabricate advanced semiconductor devices such as high voltage transistors, photoelectronics, and optoelectronic devices. It is built on a fully automated 400 mm platform and features laser-driven, scanning optics and a dual-source, multi-gas, chemical vapor deposition (CVD) process. The etcher/asher utilizes a novel, non-oxidizing plasma process that requires no additional etching steps and provides high film quality and excellent uniformity on any substrate type. PEP Iridia is equipped with several tools for process control and repeatability, including an advanced in situ optical monitor equipment. Its adaptive control system automatically maintains deposition parameters such as temperature, pressure, gas flow rates, and etching rates, to ensure low-variation and repeatable device fabrication processes. Additionally, the built-in process monitoring unit also assists in attaining accurate wafer-level processes with consistent across-wafer uniformity. GASONICS PEP Iridia has a sophisticated robotics machine that performs wafer loading, fetching, sorting, and other functions. It delivers outstanding performance in terms of through-plated thickness, uniformity, precision, and line integrity. This makes it suitable for the fabrication of advanced semiconductors, multilayer circuits, and high-aspect-ratio high-resolution photomasks. PEP Iridia also features an integrated gas delivery panel that allows for optimal gas flow in the etching process. The integrated controller adjusts gas mixtures to ensure process control and optimize thermal management. Furthermore, with the built-in dynamic process monitor, the tool allows for accurate process monitoring and provides real-time process data feedback. GASONICS PEP Iridia is a high-performance etcher/asher that is designed to produce uniform, reproducible, and high-quality results even on the most challenging substrates. Its intelligent design and user-friendly interface make it suitable for device development and process optimization in a wide range of semiconductor applications.