Used HITACHI M 308 #9068909 for sale

HITACHI M 308 is a professional, automated Etcher/Asher that is designed to provide high-precision, low-cost etching and ashing of substrates. Its features include a high-frequency, galvanostatic etcher, as well as low-frequency, galvanostatic asher, which can address both chemical and physical patinization of substrates. This allows for reliable etching/ashing with excellent repeatability and uniformity. The device itself consists of a base station, an ashing chamber, a gas source, and two cabinets. The base station contains all of the electronics and heating elements needed to control the flow and utilization of the gas, as well as the control panel of the device. The ashing chamber is where the substrate is placed during etching/ashing processes, and the gas source provides the gas for processing. The two cabinets house the gas source and the asher, respectively. The device utilizes a combination of RF and DC sources to etch and ash substrates. In RF etching, the high-frequency source is controlled via an external, low-impedance generator, which is used to pass RF current through the object to be etched/ashed. RF etching is capable of etching through a variety of metal and dielectric materials. DC etching, on the other hand, is used to etch/ash more delicate and less exothermic substrates. It utilizes a low-frequency source, which bypasses the current through the substrate in a far more controlled manner. HITACHI M-308 also includes a number of safety and diagnostic features. These include in-process monitoring, performance readouts, and emergency shutoff systems to ensure both user and product safety. Its temperature and deposition rate ranges are adjustable, giving users the flexibility to achieve various levels of etching/ashing. Additionally, its low cost and size make it an ideal choice for any laboratory, production or research environment.