Used HITACHI M 308 #9190914 for sale

Manufacturer
HITACHI
Model
M 308
ID: 9190914
Metal etch system With spares.
HITACHI M 308 is an etcher and asher equipment designed for applications in the semiconductor industry. It can be used for both etching and ashing in a wide variety of processes such as contact holes, stripes and vias. The system is designed for high throughput and is capable of controlling up to eight chambers at a time. The unit is equipped with a number of features that make it suitable for a variety of processes. It has a highly sensitive temperature control machine that guarantees stable temperatures for precision etching and ashing. It also has a low arcing electrical tool which minimizes the risk of unwanted sparks and electrical arc damage. Its energetic ion beam source ensures uniform coverage and uniform etching over the entire substrate. The ion beam can be tuned in energy and intensity, allowing for precise control over the etching process. Additionally, the asset has a hydrogen purge model, which prevents particles from adhering to the wafer surface and minimizes contamination. The equipment has an advanced plasma etching technology, which enables enhanced etching rates with improved resolution. The chamber is designed with four wafer bowls, allowing for the processing of up to four wafers at a time. It also has two independent robotic arm systems, allowing for the loading and unloading of wafer plates. The safety features included in the system make it suitable for use in a cleanroom environment. The unit is equipped with non-self respecting timers and is safe to operate in an environment with potentially explosive or hazardous materials present. The machine also has a gas analyzer tool which is designed to detect any gas leaks in the asset. Overall, HITACHI M-308 is an efficient and reliable etcher and asher model suitable for a variety of applications in the semiconductor industry. The equipment is highly precise and is designed with advanced features such as a temperature control system, an ion beam source, and a hydrogen purge unit to ensure optimal performance. This, combined with its safety features, makes it an ideal machine for use in a cleanroom environment.
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