Used HITACHI M 308NFXW #9103889 for sale

HITACHI M 308NFXW etcher/asher is a high performance machine that offers precision and control in a variety of etching and ashing applications. The machine is designed to perform a variety of operations including plasma etching, reactive ion etching, and inductively coupled plasma etching. The unit is powered by an automatically-adjusted, two-stage gas delivery system that provides optimal control of etching and ashing applications. M 308NFXW boasts a circular plasma generator which offers clean, uniform, and reliable discharge in order to achieve high-quality etching/ashing results. This system ensures that etching/ashed material is able to be processed at a lower temperature, while also offering a high rate of precision and reliability in order to produce consistent etching/ashing results. Additionally, the unit contains a controlled environment chamber which includes a high-density insulation to reduce the risk of damage and contamination of the substrate. HITACHI M 308NFXW also features a large pressure vacuum system that can be adjusted according to requirements, which helps to ensure a uniform working environment and the delivery of optimal etching and ashing results. M 308NFXW provides great precision when it comes to controlling the etching and ashing parameters of a process. This includes the controllable pressure and substrates' temperature, as well as etching/ashing gas flows and the optimal resolution for etching/ashing results. HITACHI M 308NFXW also includes a user-friendly control panel that allows for easy operation and adjustments for a variety of parameters. Overall, M 308NFXW Etcher/Asher is an excellent machine for a variety of etching and ashing applications. It is capable of delivering reliable and uniform results with consistent precision, therefore ensuring its quality when it comes to producing superior etching/ashing results. This makes HITACHI M 308NFXW an ideal etcher/asher for a wide range of applications.