Used HITACHI M 318SX #136433 for sale

HITACHI M 318SX
Manufacturer
HITACHI
Model
M 318SX
ID: 136433
Wafer Size: 8"
Vintage: 1994
Dry etcher, 8", 1994 vintage.
HITACHI M 318SX is a semiconductor etcher / asher instrument developed to accurately and efficiently perform various LE (Lithography etching) processes. Designed for established semiconductor applications, M 318SX is a fully-featured template etcher / asher capable of producing ultra-thin multi-layer devices, which is made possible through its precision electro-mechanical design. HITACHI M 318SX employs a Multiple Patterning Equipment (MPS) to accurately and efficiently pattern precision structures, while also providing a high-quality polymer film results. M 318SX features an Integrated Process Solution (IPS) capable of shrinking line and space features to as small as 0.25 microns, while also providing a full range of capabilities including single, double and triple patterning. HITACHI M 318SX performs high ion-etching current plasma etching and ashing processes, including backside etching, overcoat etching and Selective Etch Anisotropic Etching (SEAE), which can be used to form high aspect ratio channels and trenches. M 318SX has an advanced high resolution 3D imaging system which is coupled with a high resolution FIB/SEM for extremely accurate etching. HITACHI M 318SX is also capable of performing both electrochemical etching and wet etching processes, depending on the material and features being etched. M 318SX is excellent for both single- and multi-step processes and can be easily integrated with automated process control systems. Furthermore, HITACHI M 318SX is also equipped with a large touch screen display, allowing users to customize the interface for maximum efficiency and convenience. M 318SX is an extremely versatile, highly efficient unit for producing precision etch and asher structures for a variety of LE processes. Utilizing its powerful MPS and IPS capabilities, coupled with its high-resolution imaging and FIB/SEM, HITACHI M 318SX is capable of producing ultra-thin multi-layer devices with incredibly fine feature resolutions. M 318SX is an ideal solution for experienced semiconductor users looking for a machine that offers outstanding performance and unmatched process control.
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