Used HITACHI M 501AW #9142682 for sale

HITACHI M-501AW is an etcher/asher designed for precision etching and ashing of semiconductor wafers. It is capable of etching at high speeds and in tight tolerances with excellent repeatability. M-501AW utilizes state-of-the-art technology to ensure wafer quality and can be used with both HF and plasma-based etching technologies. HITACHI M-501AW features multiple process inlets and outlets, high-density processing capability, a flexible control system, and optimal gas control. M-501AW is capable of etching on a flat or in a large open 3-D process station. It features high-precision automated loading and unloading of wafers with track-locking positions that guarantee the position accuracy and repeatability of etched patterns. HITACHI M-501AW's gas control technology allows for minimal gas flow and precise dynamic control of various process gases. M-501AW can control multiple gases in each etching step, allowing for more accurate etching processes. HITACHI M-501AW is designed to be a reliable and effective asher. Its cutting-edge technology ensures high throughput, low contamination, and excellent uniformity. It also features an advanced vacuum system that minimizes risk of stiction and ensures ultra-low particle levels during etching. M-501AW's plasma etching pre-clean step also helps to reduce dust levels and improve process repeatability. HITACHI M-501AW is also an ultra-high precision asher. Its automated ashing process ensures that the etch depths are accurate and repeatable every time. It can be used for a variety of applications including deep etching, back end of line (BEOL) processing, and patterning with high aspect ratios. M-501AW is also designed to be environmentally friendly with low power consumption and an advanced gas management system to reduce gas consumption and improve safety. Overall, HITACHI M-501AW is an advanced etching and asher machine designed for precise and repeatable processes in a variety of applications. It features automation, accuracy, and efficiency that make it an ideal solution for all types of semiconductor wafer etching and ashing needs.