Used HITACHI M 511AE #9133920 for sale
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ID: 9133920
Wafer Size: 8"
Vintage: 1996
Plasma etching system, 8"
System configuration: 3-Poly CH
Etching CH gases: N2, SF6, CL2, CF4, Ar, O2
Gas Jungle Information :
N2 : STEC7440-20SCCM, STEC4400-200SCCM
SF6 : STEC7440, 20SCCM, 300SCCM
Cl2 : STEC7440-50SCCM, STEC4400-200SCCM
CF4 : STEC7440, 50SCCM
O2 : STEC4400, 2SLM
Ar : STEC7440, 300SCCM
HW Unit :
PC Rack
Transfer box
Main body
Chiller
1996 vintage.
HITACHI M 511AE Asher/Etcher is a high-tech micro subtractive processing tool designed for use in industrial and research-level applications. This device is capable of exacting control over the range of chemical etching and sputtering techniques used for coating, depositing, and removing materials at the nanoscale. Characterized by its rugged construction and multistorage capacity, HITACHI M 511 AE gives users the functions and refinements to address a wide variety of sample fabrication processes. M 511AE is equipped with a heavy-duty, industrial-grade manifold, ideal for handling large process orders, as well as flexible power options, custom-configured for a broad range of sample-specific requirements. The device is loaded with a number of dedicated attachment components, including rotary feeders, a source loader, and multi-level storage containers, each optimized for precise parameter control and robust performance. The precision gas distribution tube provides user-defined residence times and can be adjusted to meet the needs of various etched species. M 511 AE is capable of processing a variety of substrates, including metals, polymers, alloys, ceramics, and ceramics with metals. The chamber's generous 4" feed aperture enables users to conveniently introduce sample material in rougher grain sizes in any desired orientation, without damaging the sample surfaces. The 511AE's integrated vacuum system guarantees environmentally secure etching in a controlled environment. In addition to its etching and sputtering capabilities, HITACHI M 511AE has the ability to perform additional processing techniques, such as ball milling and pulse electrical deposition. The flexibility of the device is further enhanced by an adjustable cycle time and uniform temperature control to ensure repeatable etch results with no distortion. With programmable settings, HITACHI M 511 AE is ideal for repetitive processes and delivers highest-quality substrates with the highest precision and repeatability. M 511AE is safety-certified and is designed to comply with industry safety standards. Thoughtful design features, like the fail-safe shutoff valve, robust module detection system and enclosed switchbox are designed to protect and preserve delicate samples, ensure process accuracy, and reduce the potential for user injury and equipment damage. M 511 AE is an advanced-technology etcher/asher, ideal for use in engine workshop, microfabrication labs, and research facilities. The ease of operation, combined with the superior performance, ensures that results are always reliable and accurate.
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