Used HITACHI M-602 #9364269 for sale
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HITACHI M-602 is a widely used etching or ashing device designed to perform etching and ashing processes on wafers. It is a tool used in the production of semiconductor wafers and is used to etch away undesired layers of materials from the wafer's surface. M-602 can be used to fabricate a range of wafers such as single-crystal silicon and silicon on insulators (SOI) wafers. HITACHI M-602 features a Plasma Enhanced Chemical Vapor Deposition (PECVD) chamber that is capable of performing high-speed ashing processes. It is equipped with a radio-frequency generator that is highly efficient and produces long-lasting plasma discharges. The PECVD chamber is optimized to create a modified atmosphere in order to facilitate the etching and ashing processes. In addition, the PECVD chamber features a quartz window that allows a clear observation of the plasma processing progress. M-602 also has a wafer transfer equipment that can transfer wafers from the PECVD chamber to an analytical system or handling tray. The wafer transfer unit is designed for high-accuracy wafer positioning, providing users with the ability to accurately etch and ashing wafers. Furthermore, HITACHI M-602 is equipped with an automatic backside treatment machine that provides an automated cleaning process of the wafer's backside. M-602 provides several operational modes which are tailored to meet the specific requirements of different types of wafer processing. It also comes with a built-in operating tool (OSI) that allows users to adjust and store the parameters of the etching/ashing processes. Additionally, HITACHI M-602 also has an array of diagnostic tools including an off-line monitoring asset, temperature/pressure sensors, and other miscellaneous safety/monitoring functions. Overall, M-602 is an advanced etching/ashing device specifically designed to perform etching and ashing processes on wafers. It has a host of features and functions that enable it to foster high-precision etching and ashing processes. HITACHI M-602 is easy to use and can be tailored to meet the demands of diverse types of wafers and applications. Furthermore, M-602 is designed to provide a reliable and efficient result.
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