Used HITACHI M 612A #9266136 for sale

HITACHI M 612A is an versatile etch and asher equipment that offers a powerful, precise, and reliable solution for a variety of processing requirements. M 612A offers high throughput capabilities, with a maximum speed of up to 400,000 parts/hour. Its efficient processing capability is facilitated by a variety of process modes, such as pulse etch and pulse asher. The system includes two processing heads, each with a 2-inch working area, allowing for high resolution processing. The unit features two different processing modes, allowing for the processing of a wide variety of materials, including non-metals. For etching, the machine features an inductively coupled sputtering tool, which utilizes a high frequency transformer to create an unstable plasma in the working zone. This plasma causes the target material to undergo a small physical displacement, breaking molecular bonds and allowing particles to be driven away. The pulse asher process utilizes an inductively coupled plasma source and a high voltage pulse generator to generate a high temperature plasma. This plasma can reach temperatures up to 3500 oC, allowing for rapid and efficient ashing of polyimide, polyamide, and polycarbonate materials. HITACHI M 612A can process a variety of substrates, including silicon wafers, ceramic substrates, and quartz. It is designed to be highly reliable and reduces downtime with the use of an external controller and automatic power off. The controller also monitors the process parameters and allows the user to adjust settings such as sputtering speed, number of processes, and process time. M 612A has been designed for safety, with no hazardous gases being released during the processing, and using a filtered exhaust asset to blow away any residue particles. The model also features a built-in thermal heating equipment, helping to ensure operator safety. Overall, HITACHI M 612A is a highly reliable and efficient etching and ashing system, suitable for a wide variety of substrate materials. Its wide range of process modes and precise control capabilities make it ideal for creating high resolution features required for the development of microelectronic components.