Used HITACHI M 712E #293750871 for sale

HITACHI M 712E is an etcher/asher designed for various device fabrication operations. The equipment is a platform-independent, non-contact equipment offering reliable and reproducible etching processes. The system excels at anisotropic etching as well as precise trimming of edges, contacts, and vias. The etching equipment supports a wide range of etch processes, including alumina, silicide, and tantalum etching. This ensures that it is an ideal tool for various device fabrication operations. The equipment features a patented feedthrough design that allows for precise etch control and quick nozzle changes. It also offers automated gas sequencing to ensure optimal etch performance and accuracy. The unit allows for backside via-etching as well as wafer protection, allowing for robust protection during process steps. Its hardware design, consisting of an electronic heating source, an RF generator, and a gas delivery machine, ensures uniform temperature distribution and high etch yields. Along with offering excellent temperature control and repeatability, its powerful microprocessor ensures optimal performance and etches accurately even under challenging conditions. The tool supports a variety of vessel geometry types, including up to six etch chambers with the flexibility to exchange chambers quickly. Additionally, it also features a multi-platen process cycle enabling it to handle a wide range of etch dynamics and parameters. Combined with the asset's user-friendly interface, operators can monitor parameters directly for efficient etching processes. Finally, its photoaxis alignment capability ensures superior accuracy, with up to six axes of movement, allowing for precise wafer alignment. Overall, HITACHI M712E etcher/asher is designed to deliver reliable, repeatable results for various device fabrication operations. Its patented feedthrough design facilitates lively process control and quick nozzle changes. The model also features a powerful microprocessor, robust hardware elements, and photoaxis alignment, enabling it to handle even challenging conditions and topics. Its user-friendly interface allows operators to monitor parameters directly for efficient etching processes, while the multi-platen process cycle caters to a wide range of etching dynamics.