Used HITACHI U-722 #9211147 for sale

HITACHI U-722 is a dual zone, dry film etcher and asher. It is designed for a variety of etching and ashing processes used in semiconductor manufacturing. It utilizes a maximum of two process chambers to etch or ash components from a single wafer. The machine is capable of achieving high-uniformity results for a variety of etching or ashing operations such as Chemical Vapor Deposition, Plasma Enhanced Chemical Vapor Deposition, Photoresist stripping, Ashing, and Dry Etching. U-722 combines the capability of an etching system and an asher. In etching operations, the machine utilizes a heated oxide-coated reference board for accurate etching specific to customer requirements. Both the reference board and the wafer under etching receive RF post-deposition, while the reference board provides a surface to keep the wafer in contact with the plate during etching. This provides fast, efficient, and uniform etching of the substrate. The asher also utilizes a heated oxide-coated reference board to achieve uniform ashing of the substrate. The automation of HITACHI U-722 also makes it easy to operate. It has a built-in auto-sequence controller with temperature and pressure control of each process chamber. The system is also easy to monitor with a graphic user interface, allowing operators to monitor the process in real time. The machine's precision is another key feature of U-722. Both its etching and its ashing process feature precise residual gas control, allowing for high uniformity and good yields. Its ion source is also engineered to impart uniform uniformity across the entire wafer surface due to its angled nozzle design. The design also provides the operator with a clear view of the etching or ashing process, ensuring that all operations are being executed to the exact specification. Lastly, HITACHI U-722 is designed for reliable and low-maintenance operation. The machine is equipped with easy-to-service, lifetime components and a hermetically sealed chamber construction that allows for positive pressure throughout the whole process cycle. This provides minimized downtime due to minimal part replacement. This makes U-722 an ideal choice for reliable, repeatable, and cost-effective etching and ashing operations.