Used KEM / KOKUSAI Lambda 200C #293643017 for sale

KEM / KOKUSAI Lambda 200C is an etcher/asher that is ideal for a broad range of applications, including semiconductor and flat panel materials. This machine uses high voltage and current to etch or ash a variety of materials ranging from silicon to glass. KEM Lambda 200C utilizes a substrate holder, plasma chamber, and process control unit to control the process parameters. The control unit enables the operator to accurately control the process by allowing fine adjustments of the RF power level, frequency and bias. The substrate holder is capable of accommodating substrates with a thickness up to of 8" (20 cm) and with temperatures as low as -60oC (-75oF). A variety of holder configurations are available to support a range of substrate materials and sizes. The plasma chamber consists of a stainless steel chamber with a water-cooled chamber head and electrodes, with a vacuum-sealed quartz window. It is designed for use with low-temperature process gases and enables the substrate to be exposed to higher temperatures than other processes. The process control unit is intuitive and user-friendly, allowing easy selection of parameters such as RF power, frequency, bias, and gas flow. It also allows the operator to adjust the process parameters to achieve desired results. The process control unit is also capable of automated reporting, allowing the operator to store data and monitor the results of their etch/ash process. KOKUSAI Lambda 200C is capable of cleaning up to 4" (10 cm) substrates and is customizable to fit the specifications of most semiconductor and flat panel materials. With its intuitive interface and built-in safety features, Lambda 200C is an ideal solution for any etching/ashing process.