Used KEM / KOKUSAI Lambda 200IE #188566 for sale

KEM / KOKUSAI Lambda 200IE is an etcher and asher designed to process a wide range of semiconductor wafers. This equipment uses LAM-5000 technology for delivering electrons to the wafer surface. KEM Lambda 200IE consists of a two-piece loadlock system which holds up to 8 substrates. The automated cassette is connected to the RF generator, ion source, magnetron power supply, and vacuum unit. KOKUSAI Lambda 200IE is equipped with a high-power RF generator and automatic matching that allow precise control of etching rate and uniformity. The variable loadlock approach enables adaptation of multiple wafer sizes and materials. Additionally, the use of the magnetron power supply enables precise control over etching and ashing time, temperature, and pressure. The machine features an easy-to-operate graphical user interface and multiple process chambers. The two separate chambers are dedicated to dry and wet etching. The dry etching chamber is equipped with Ar and N2 for etching and subtractive dry etching such as SF6. The wet etching chamber is equipped with DI-water with a temperature range of 0-50 degrees Celsius. High quality conformal layer etching is achieved through precise control of temperature and pressure. Lambda 200IE also features multiple configurations suitable for a variety of product applications. For instance, with the addition of the RIE/RIEC adapter, the tool can be used for deep etching. The Handy Probe microscope is available for visual inspection of sample structure and uniformity. KEM / KOKUSAI Lambda 200IE is a reliable and versatile tool for semiconductor wafer processing. This asset offers precise control over many process variables with easy-to-use configurations. The two dedicated chambers provide etching and ashing capabilities, while also featuring temperature and pressure control for high quality conformal layer etching.