Used LAM RESEARCH 2300 e4 Flex EX #9237727 for sale

LAM RESEARCH 2300 e4 Flex EX is a powerful, multi-functional etcher and asher designed to handle a wide range of materials. The equipment incorporates LAM's Automated Endpoint Detection (AED) technology to provide precise result control, while also offering the highest flexibility of beam and recipe parameters. The system offers four independent resist sources for more efficient and accurate results as well as multiple-wafer processing capabilities. The unit offers precise control of etch depth, etch rate, etch area, and reproducibility of processing parameters, as well as excellent uniformity. The etch and asher tool is built for multiple run rate and processing speed optimization. It features two independent reaction chambers, an E-beam unit for sample material removal, and load-locked configuration that can unload and load multiple wafers at a time. The machine also features a tight temperature and pressure control, and a range of chemical gases to match the user-defined requirements. 2300 e4 Flex EX also offers flexible beam configurations with a wide range of beam currents, which allows for higher throughput and thicker films. The tool also offers a wide range of configurable features such as automatic endpoint detection (AED), automated Level Profiling (ALP), programmable recipe cleanup routines, and various sensor interfaces to optimize etching and ashing process. In addition, the unit features a ceramic liner for long-term cleanroom operation. The asset's interfaces are user-friendly and easy to use, allowing for fast and accurate parameter resetting. Also, the tool is equipped with a real-time monitoring model, which helps in tracking the progress of each wafer run. The device includes an on-board recipe generator for quick recipe creation, and the built-in gas management feature helps to monitor gases usage. Additionally, LAM RESEARCH 2300 e4 Flex EX comes with an RFID reader for traceability of process data. This efficient and reliable etch and asher tool is ideal for users who need optimal performance in short run times. It provides efficient wafer throughput, uniformity, and accurate results with minimal user intervention. Its advanced features make it a suitable choice for a variety of applications including semiconductor, MEMS, medical, and LED device fabrication.