Used LAM RESEARCH 2300 e5 Kiyo #9409252 for sale
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ID: 9409252
Poly etchers
Cassette, 12"
Chambers:
(2) KIYO45
(2) KIYO EX
Stripper
Platform type: E5
EFEM:
(3) TDK TAS300 Loadport, P/N: S2096-76
KAWASAKI 3NT510B-A002 ATM Robot
BROOKS AUTOMATION 799-058309-003 ATM Robot
BROOKS AUTOMATION 196635 TM Robot, P/N: 401600-594-0001
EDWARD EPX180N IPump, P/N: A419-42-212
(5) GE 605-109114-001 CPUs
(5) 605-707109-012 VIOPs
(5) ENGENUITY 810-046015-009
(2) 853-031727-007 Temperature control units
(4) 810-495659-304 ESC Power supplies
(4) 685-801852-015 OES
VoDM
MKS Revolution III remote plasma source, P/N: 685-045803R034
(4) ESC, P/N: 839-019090-374
Gas configuration:
Gas box type: IGS
(18) Gas lines
MFC:
HORIBA SEC-Z719MGX
HORIBA SEC2719JX
HORIBA D219-SCT
SAM 2480G1
(3) MKS He UPCs
Strip gas:
(3) HORIBA SEC-Z719MGX
Vacuum gauge:
(3) MKS E58B-31775 Process vacuum gauges, 0.1 Torr
(3) MKS E28B-30200 Chamber vacuum gauges, 1 Torr
(2) MKS B28D-30518 Fore line vacuum gauges, 10 Torr
MKS 28PS0063 TM Vacuum gauge, P/N: 109070019CE
MKS 901P-81050-0070 Airkock1 vacuum gauge
MKS 901P-81050-0070 Airlock2 vacuum gauge
ACATEL ATH2800M Turbo pump
ACATEL Mag Power Turbo pump controller
(2) EDWARD STP-XA2703CV Turbo pumps
(2) EDWARD SCU-1600 Turbo pump controllers
BIAS RF Generator, P/N: 660-063437R003
TCP RF Generator
(2) BIAS RF Generators
(2) TCP RF Generators, P/N: 660-088888-002
(4) BIAS RF Matchers, P/N: 832-038915-001
(4) TCP RF Matchers, P/N: 835-043759-004
(4) BIAS RF Cables
(4) TCP RF Cables.
LAM RESEARCH 2300 e5 Kiyo is an advanced etch and ash tool specifically designed for ultra-low temperature processing of device substrates including silicon wafers. Using advanced plasma physics and equipment engineering, 2300 e5 Kiyo is capable of achieving temperatures below 10 degrees Celsius during the etching and ashing process. This allows for more precise control over the etch results enabling device designers to more accurately model and predict substrate failure before fabrication. LAM RESEARCH 2300 e5 Kiyo incorporates a number of different techniques to create accurate etching. Its combination of gas and plasma delivery systems allow for precise control of the process environment, ensuring that the substrate's material properties are not altered. 2300 e5 Kiyo utilizes a unique high frequency linear plasma source to create high energy ion bombardment at its source point, which provides etches and ashes with extremely high purity and accuracy. Moreover, LAM RESEARCH 2300 e5 Kiyo's advanced programming capabilities make it quite versatile, allowing it to be used in a wide range of processes including etching, ashing, deposition, and metallization. 2300 e5 Kiyo also features a variety of safety functions including an automatic gas shutoff in case of overpressure, an automatic shutoff in case of overcurrent, and an integrated pressure monitoring system to ensure the process environment is consistently monitored throughout the fabrication process. In addition to its impressive processing capabilities, LAM RESEARCH 2300 e5 Kiyo is able to reduce cost and improve productivity through its utilization of advanced robotics, allowing for continuous non-stop batch processing. This feature enables users to process more devices in a shorter amount of time, leading to higher yields and faster turnaround times. Overall, 2300 e5 Kiyo is an advanced etcher and asher designed to provide extremely precise results in a range of ultra-low temperature processes. Through its combination of advanced plasma physics, equipment engineering and robotics, LAM RESEARCH 2300 e5 Kiyo is a powerful and reliable tool for device processing and fabrication.
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