Used LAM RESEARCH 2300 Exelan Flex #293675856 for sale

LAM 2300 Asher/Etcher is a dry-process asher/etcher designed for use in semiconductor and related process operations. It is ideal for processes requiring low temperature and low or high pressure oxygen plasma. The advanced, feature-rich design of 2300 includes an integrated carrier and heater, twin-rotor, closed-loop mass flow equipment, integrated vacuum deposition, and integrated high-efficiency exhaust. The internal heater and enclosed gas delivery system of LAM 2300 allow for the precise control of substrate processing temperatures and uniformity of profile regimes. The integrated twin-rotor closed-loop mass flow unit ensures process gases remain within safe temperature and pressure parameters throughout the processing cycle. The integrated vacuum deposition module can be used to coat substrates with a range of materials from metals, polymers, and thin film oxide layers. 2300's innovative design and intuitive control machine have enabled it to become one of the industry's most reliable preservation etchers/ashers. It's compatible with a variety of standard process tubes, with a range of sizes and heated plate sizes available. LAM 2300 also features an advanced, high-efficiency, high-intensity exhaust tool for the efficient removal of exhaust by-products. The exhaust asset allows for quick model set up and pressure maintenance while also minimizing the concentration of concentrated fumes. 2300 provides a focused beam of gas that helps to help increase the quality of the etching and the uniformity of features. The two-stage variable power source on LAM 2300 offers precise control of process parameters including time, pressure, gas ratio, flow rate, and the specified concentration of the process gases. These parameters can be varied at will during the process, allowing for excellent process quality and repeatability. Additionally, 2300's comprehensive, integrated safety features protect your personnel from the risks associated with hazardous process conditions.