Used LAM RESEARCH 2300 Exelan #9003988 for sale
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ID: 9003988
Flex etch system, 8"
(3) Chambers
2300 Ver 2.0 Mainframe
Robot CDM
Cable Lengths (TM to Sub Panel) : 100ft
Loaders included
Cassette Interface:
(3x) Open Cassette
25 Slot Input Buffer Station
User Interface:
Front Mount
Side
(3x) 2300 Exelan Flex LEAP Etch Chambers:
Kalrez O-rings
PM ISO Valve (Chemraz Rocker V)
Dual Chiller
New Heater for IGS Gases
Cable Lengths (EMO/Gateway) : 50ft
Quick Clean Kit
Service Tool Kit
Gas Box:
(9) Gas line Config (IGS)
(1) Additional Gas line IGS)
Heated Gas line Package
Gas Interface Box (Covers 3 Process Modules)
Gas Box Configuration (MFC: HORIBA STEC Z300)
Line# - MFC Type - Gas - Size (sccm)
1 SZ313 C4F8 50
2 SZ313 NSR 50
3 SZ313 Ar 1000
4 SZ313 O2 200
5 SZ313 CO 200
6 SZ313 CF4 200
7 SZ313 H2 500
8 SZ313 CH2F2 50
9 SZ313 O2 3000
10 SZ313 N2 1000
11 SZ313 CHF3 100
12 SZ313 O2 20
RPDB for Dual Channel
Pump Exhaust Dilution Box
Options:
System UPS Support
GFI CBs
System Calibration & Alignment Kit
Signal Light Tower (R-A-G-B-C)
200mm Signal Lamp Tower
Mini Environment Air Intake
Software:
APC Recipe Tuning
2nd HSMS(Fab Common) Support
De-installed
2007 vintage.
LAM RESEARCH 2300 Exelan is an advanced, high-precision plasma etching equipment used for creating high-quality, intricate patterns on the surface of materials like silicon and glass. The system is designed to provide precise control over the etching process, allowing for the creation of highly intricate patterns with minimal edge-effects. The Exelan unit is equipped with an advanced imaging machine and integrated pattern control which enables precise pattern control. The imaging tool captures images of the substrate which are then used to control both the location of the etching and the amount of material to be removed. The asset is also equipped with a closed-loop power regulator, allowing the model to make precise adjustments to the power output during etching, ensuring that the material is etched within the desired parameters. The equipment is programmed via software, allowing the user to customize their etch patterns with an intuitive user interface. The system also features an advanced query language which allows for automated data evaluation. This feature allows users to quickly analyze the etch patterns and make adjustments to the etching process in real time. The Exelan unit is designed for use in semiconductor production, offering the highest-level of accuracy for creating intricate patterns on silicon and glass substrates. The machine was designed to be extremely reliable and offers a low failure rate with minimal downtime. The advanced imaging tool, precise power control, and advanced query language enable the user to create precise etchings quickly and with great accuracy.
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