Used LAM RESEARCH 2300 Exelan #9054659 for sale
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ID: 9054659
Wafer Size: 8"
Vintage: 2004
Oxide etcher, 8"
Cass nest plastic, 8"
Wafer shape: SNNF (Semi notch no flat)
(4) Process chambers:
Position 1: 2300 Exelan
Position 2: 2300 Exelan
Position 3: 2300 Exelan
Position 4: 2300 Exelan
Front end load port cassette:
(3) Open cassettes
Backing pumps for TM iPX
User interface option: Side & front monitor UI
Earth leakage breaker ELB
Signal tower
SECS/ GEM
Platform type: Version 2
2300 Exelan options:
Chamber type 2300 Exelan CFE
Upper electrode heated
ESC Cooling dual zone
1600 L/S EDWARDS Turbo pump, 8"
Endpoint detection optical emission spectroscopy
Chamber isolation valve rocker gate valve
2300 Gas box:
Gas system type: Enhanced gas box II
Std stacking kits: 4 PM Stacking kit
Gas line 12 gas configuration
Gas box inlet option: Regulated inlet gas panel
Gas filters: Standard filter
Gas box configuration:
PM1 MFC Type: Unit 1661 metal, digital
Line 1 Ar 1000 sccm
Line 2 O2 50 sccm
Line 3 N2 200 sccm
Line 4 O2 2000 sccm
Line 5 CHF3 100 sccm
Line 6 C4F8 20 sccm
Line 7 CH2F2 50 sccm
Line 8 C4F8 50 sccm
Line 9 CF4 100 sccm
Line 10 NSR70%He/30%O2100 sccm
Line 11 C4F6 20 sccm
Line 12 NSR Xe 300 sccm
Line 13 HeO2 20 sccm (Tuning gas)
PM2 MFC Type: Unit 1661 metal, digital
Line 1 Ar 1000 sccm
Line 2 O2 50 sccm
Line 3 N2 200 sccm
Line 4 O2 2000 sccm
Line 5 CHF3 100 sccm
Line 6 C4F8 20 sccm
Line 7 CH2F2 50 sccm
Line 8 C4F8 50 sccm
Line 9 CF4 100 sccm
Line 10 Line 10 NSR70%He/30%O2100 sccm NSR70%He/30%O2100 sccm
Line 11 C4F6 20 sccm
Line 12 NSR Xe 300 sccm
Line 13 HeO2 20 sccm (Tuning gas)
PM3 MFC Type: Unit 1661 metal, digital
Line 1 Ar 1000 sccm
Line 2 O2 50 sccm
Line 3 N2 200 sccm
Line 4 O2 2000 sccm
Line 5 CHF3 100 sccm
Line 6 C4F8 20 sccm
Line 7 CH2F2 50 sccm
Line 8 C4F8 50 sccm
Line 9 CF4 100 sccm
Line 10 NSR70%He/30%O2100 sccm
Line 11 C4F6 20 sccm
Line 12 NSR Xe 300 sccm
Line 13 HeO2 20 sccm (Tuning gas)
PM4 MFC Type: Unit 1661 metal, digital
Line 1 Ar 1000 sccm
Line 2 O2 50 sccm
Line 3 N2 200 sccm
Line 4 O2 2000 sccm
Line 5 CHF3 100 sccm
Line 6 C4F8 20 sccm
Line 7 CH2F2 50 sccm
Line 8 C4F8 50 sccm
Line 9 CF4 100 sccm
Line 10 NSR70%He/30%O2100 sccm
Line 11 C4F6 20 sccm
Line 12 NSR Xe 300 sccm
Line 13 HeO2 20 sccm (Tuning gas)
2300 Peripherals:
DFC Backing pumps cust supply
DFC TCU Config LAM supply: (4) 4080 Plus
Gas scrubber: EBARA GTE-3-0WVT
Power distribution module: RPDB
Dry pumps:
TM EDWARDS iPX 100A
PM1 EBARA AA100W
PM2 EBARA AA100W
PM3 EBARA AA100W
PM4 EBARA AA100W
No SMIF interface
2004 vintage.
LAM RESEARCH 2300 Exelan is an advanced etcher / asher equipment designed for a wide range of advanced process requirements. It is a multi-tool platform that is modular and scalable to meet the needs of a variety of process applications. The Exelan offers a wide range of configurable parameters and options to deliver superior performance in a small footprint. The system is equipped with advanced technologies such as an advanced magnetron source, an integrated support unit including a real-time feedback machine, and advanced wafer tracking and transfer capabilities. The integrated, advanced magnetron source with its broad range of power levels, frequencies, and gases provides superior accuracy and repeatability for all applications. The configuration flexibility of the Exelan allows customers to choose their own level of customization to best meet their particular requirements. The included real-time feedback tool provides closed-loop control, enabling precision pinpoint recipes that can be easily modified and applied across the tool. 2300 Exelan has advanced wafer tracking and transfer capabilities that combine precision alignment, positioning, and displacement sensors along with sophisticated software algorithms to achieve unsurpassed process control and productivity. This extensive componentry, along with the integrated hardware, software, and communications capabilities, form the basis for an advanced, full production-ready etching platform that is both robust and reliable. The Exelan can also provide remote support through the standard Ethernet connection for monitoring, diagnostics, and upgrades. This asset allows customers to the flexibility to customize their software environment to meet their own specific requirements. LAM RESEARCH 2300 Exelan provides an advanced, full-featured platform and the flexibility to meet a wide variety of application needs. Its modular design allows for scalability and configurability, while its proprietary control model enables precise and repeatable processes. This user-friendly platform can be easily upgraded to meet future needs as well as integrated into existing production lines. With its advanced magnetron source, integrated support equipment, and wafer tracking and transfer capabilities, the Exelan is an ideal choice for any process requirement.
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