Used LAM RESEARCH 2300 Flex 45 #9244869 for sale

ID: 9244869
Wafer Size: 12"
Vintage: 2007
Etcher, 12" 2007 vintage.
LAM RESEARCH 2300 Flex 45 is an etcher/asher equipment designed for high volume production. It features advanced etching and ashing capabilities with low thermal budget requirements. The system utilizes a patented dynamic etch/ash process that provides maximum flexibility. It is the perfect solution for high-precision and high-throughput wafer processing. 2300 Flex 45 is capable of processing wafers with a round up to 12" and can handle die sizes up to 20 microns. It offers three etching options, allowing users to select the process parameters needed for their particular application. The first option is low temperature etching which uses plasma to create a softer etch that reduces the micro-charges that can cause damage to thin die. The second option is high temperature etching which uses a higher temperature and thermal energy to create a more aggressive, deep etch. The third option is a hybrid etch/ash process that combines the two processes for a more precise result. LAM RESEARCH 2300 Flex 45 boasts a number of other advanced features that make it an ideal choice for etching and ashing applications. Its built-in chemistry mixing unit gives users the ability to change the process chemistry to optimize etch/ash results. It also features a multi-mode pyrometer that can measure temperature, pressure, and time. Additionally, the pyrometer can be used to display graphic plots of wafer data in order to monitor etching and ashing processes in real-time. The machine has several safety features, such as a built-in emergency shutoff switch and pressure monitoring tool to help prevent accidents. Its modular construction allows for easy maintenance and upgrades. The asset can also be programmed to meet specific production needs. 2300 Flex 45 is a reliable, high-performance etcher/asher that can meet the needs of high-volume production. The model's advanced etch/ash capabilities, low thermal budget requirements, and flexible process parameters make it an excellent choice for etching and ashing applications.
There are no reviews yet