Used LAM RESEARCH 2300 Flex #9062178 for sale
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ID: 9062178
Wafer Size: 12"
Vintage: 2003
Dry etcher, 12"
Non-SMIF
GEM
Wafer OF type: notch at 6 o'clock
TM Robot: Brooks Mag7
EFEM Robot: Brooks (white)
PM: 3-Ch
TMP: (3) Alcatel ATM 1600
Generator: (3) APEX1513/RFDS
Gas Box: Digital gas box
Loadport
2003 vintage.
LAM RESEARCH 2300 Flex is a multi-function, electromagnetic plasma etcher/ashers specifically designed for semiconductor fabrication and research. It has the capability of performing etching, passivation, oxide stripping, and metal etching processes. The equipment is composed of a compact and expandable base unit, which is equipped with a high frequency power supply, a material handling system, a process chamber, and a vacuum pump. The high frequency power supply allows the utmost accuracy and repeatability of process parameters, even when operating over a wide range of voltages, currents, and pressures. The material handling unit ensures accurate, repeatable loading, unloading, and transfer of materials. This machine may consist of a robot, one or several load locks which serve to isolate the process chamber from the ambient environment, or a rotating drum feed tool depending on the user's requirements. The process chamber is the place where the etching and ashing processes take place. The chamber is internally connected to the high frequency power supply and vacuum pump that provide a controlled, ultra-high vacuum environment for processing. The chamber is engineered to have excellent optically clear walls and very low outgassing that allows the asset to maintain both high vacuum and low internal pressures necessary for sensitive etching and ashing processes. 2300 Flex can be configured with various gas and chemical components for flexibility to process many materials including metals, ceramics, oxides, and polymers. The model can also be used for the processing and curing of photoresists and the thinning of wafers. LAM RESEARCH 2300 Flex is a user-friendly, modular equipment that is designed for both batch and in-line production applications. It offers reliability, high process control accuracy, and a wide range of features that make it an excellent choice for etching and ashing processes.
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