Used LAM RESEARCH 2300 Flex #9157500 for sale
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ID: 9157500
Wafer Size: 12"
Vintage: 2003
Oxide etcher, 12"
(3) Chambers
HDD Not included
Currently warehoused
2003 vintage.
LAM RESEARCH 2300 Flex is an etcher/asher equipment designed to accurately etch and asher complex patterns on semiconductor wafers. It is a highly automated system which is compatible with a variety of technologies such as plasma etch, ion beam milling, and chemical etch. The unit uses integrated process control, automated stage motion, and recipe-driven machine operation to ensure precise alignment of wafers and uniformity of etch/ash. 2300 Flex provides high-throughput with low-variability, making it ideal for mass production of semiconductor wafers. The machine utilizes a multi-chamber process chamber, in which different process steps can be manipulated independently. It is also capable of simultaneous resist coating and ashing. This allows for efficient processing of complex photomasks and feature configurations, which can lead to minimal etch bias and improved uniformity. The tool also offers high resolution imaging, dynamic O2 purge clean, and Adaptive Process Control (APC), which provide precise etching control. This technology ensures accuracy and repeatability of processes while avoiding damage to the wafer. Additionally, LAM RESEARCH 2300 Flex features real-time diagnostics to monitor the etch process and detect any anomalies, as well as a range of chamber configurations and temperature options. The asset provides maximum uptime and machine availability and is designed to simplify maintenance and enable rapid changeover of etching processes. 2300 Flex is pre-configured with modules that act as a specific etch, asher, or capability, such as resist stripping or ion beam milling. These modules allow users to customize the model to fit the needs of different processes. Overall, LAM RESEARCH 2300 Flex is an advanced etcher/asher equipment that offers precise etching and ashing of complex wafer patterns. It utilizes a range of advanced process control and imaging technologies to ensure uniformity of etch/ash, while providing efficient changeover of processes. The system is reliable and designed to ensure maximum uptime and availability for a high-throughput mass production environment.
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