Used LAM RESEARCH 2300 KIYO METAL(EFEM/TM) #9134009 for sale

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ID: 9134009
Wafer Size: 12"
Vintage: 2006
Etcher, 12" EFEM / TM Configuration of SMIF Signal tower: (3)colors Number of Loadport: Missing Parts no. of ATM robot: 151864 Buffer station: 25 slots, 1 Buffer station ATM robot (1)Aligner Configuration of transfer chamber Number of loadlock: 2 LL / 4 Slot cool chamber Model of transfer robot: Megatran7 / Brooks Parts no. of rocker valve: 853-007859-9223 TM Pressure gauge: HPS Series907 / MKS TM Pressure control: MKS Series 640 LL Pressure gauge: Hasting Configuration of etch chamber Missing champer: PM2, PM3 Configuration of MW chamber Missing champer: PM1, PM4 Configuration of gas panel, etch chamber Missing gas panel: PM2, PM3 Power: 208VAC 3ph 400AMPS 50/60Hz 2006 vintage.
LAM RESEARCH 2300 KIYO Metal (EFEM/TM) is a next-generation etcher and asher used in semiconductor device fabrication. This tool is designed to enable rapid prototyping, process development, and production of advanced device features. With its advanced etch-front control and high selectivity capabilities, the 2300 KIYO TM can provide the highest level of precision gas-phase etch and asher. The 2300 KIYO can be used with a variety of substrate materials such as silicon, quartz, glass and metals. The tool is capable of supporting basic trench etch and deep hole etch parameters. Its deep hole etch capabilities allow for processing of sub-micron structures, while its shallow trench etch capabilities enable the formation of ultra-thin layers. The tool is also equipped with advanced features such as multi-zone temperature tuning and LP-RF technology to fine-tune the etching conditions for specific applications. The 2300 KIYO TM setup includes a proprietary high-frequency RF generator, ion source power supplies, linear ion guide equipment, and vacuum chamber. The tool also provides support for both 1 and 2-sided wafers as well as multiple etch and asher tools. The system includes a state-of-the-art automation controller that ensures rapid and reliable process control. The 2300 KIYO also has an integrated programmable electrostatic chuck, which ensures increased process yield. It also has built-in gas panels and vacuum chambers, which enable remote operation of the unit. The machine is designed to achieve high selectivity and improved etch rate, with a total etch rate of up to 5E10 torr. The tool also includes an automated wafer tracking tool, which ensures consistent etching and high throughput. Overall, LAM RESEARCH 2300 KIYO is a powerful etcher and asher, designed to enable rapid prototyping, process development and production of advanced device features. Its advanced features and capabilities make it ideally suited for device fabrication in the semiconductor industry.
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