Used LAM RESEARCH 2300 KIYO METAL(EFEM/TM) #9134009 for sale
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ID: 9134009
Wafer Size: 12"
Vintage: 2006
Etcher, 12"
EFEM / TM
Configuration of SMIF
Signal tower: (3)colors
Number of Loadport: Missing
Parts no. of ATM robot: 151864
Buffer station: 25 slots, 1 Buffer station
ATM robot
(1)Aligner
Configuration of transfer chamber
Number of loadlock: 2 LL / 4 Slot cool chamber
Model of transfer robot: Megatran7 / Brooks
Parts no. of rocker valve: 853-007859-9223
TM Pressure gauge: HPS Series907 / MKS
TM Pressure control: MKS Series 640
LL Pressure gauge: Hasting
Configuration of etch chamber
Missing champer: PM2, PM3
Configuration of MW chamber
Missing champer: PM1, PM4
Configuration of gas panel, etch chamber
Missing gas panel: PM2, PM3
Power:
208VAC
3ph
400AMPS
50/60Hz
2006 vintage.
LAM RESEARCH 2300 KIYO Metal (EFEM/TM) is a next-generation etcher and asher used in semiconductor device fabrication. This tool is designed to enable rapid prototyping, process development, and production of advanced device features. With its advanced etch-front control and high selectivity capabilities, the 2300 KIYO TM can provide the highest level of precision gas-phase etch and asher. The 2300 KIYO can be used with a variety of substrate materials such as silicon, quartz, glass and metals. The tool is capable of supporting basic trench etch and deep hole etch parameters. Its deep hole etch capabilities allow for processing of sub-micron structures, while its shallow trench etch capabilities enable the formation of ultra-thin layers. The tool is also equipped with advanced features such as multi-zone temperature tuning and LP-RF technology to fine-tune the etching conditions for specific applications. The 2300 KIYO TM setup includes a proprietary high-frequency RF generator, ion source power supplies, linear ion guide equipment, and vacuum chamber. The tool also provides support for both 1 and 2-sided wafers as well as multiple etch and asher tools. The system includes a state-of-the-art automation controller that ensures rapid and reliable process control. The 2300 KIYO also has an integrated programmable electrostatic chuck, which ensures increased process yield. It also has built-in gas panels and vacuum chambers, which enable remote operation of the unit. The machine is designed to achieve high selectivity and improved etch rate, with a total etch rate of up to 5E10 torr. The tool also includes an automated wafer tracking tool, which ensures consistent etching and high throughput. Overall, LAM RESEARCH 2300 KIYO is a powerful etcher and asher, designed to enable rapid prototyping, process development and production of advanced device features. Its advanced features and capabilities make it ideally suited for device fabrication in the semiconductor industry.
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