Used LAM RESEARCH 2300 Kiyo #174756 for sale
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ID: 174756
Wafer Size: 12"
Vintage: 2006
Metal dry etch system, 12"
Type of Loadport: SMIF
Number of Process Chamber: (2) Metal Etch & (2) MWAVE STRPR
Configuration of SMIF:
Signal Tower: 3-colors
Number of Loadport: 3
Parts No. of Loadport: 799-901175-004
Number of ATM Robot: 1
Parts No. of ATM Robot: 121668
Buffer Station: 25 slots, 2 Buffer Station
Aligner: 1 Aligner
Configuration of Transfer Chamber
Number of Loadlock: 2 LL / 4 Slot Cool Chamber
Model of Transfer Robot: Magnatran7 / Borrks
Parts No. of Lock Valve: 853-007859-005 / 4ea
TM Pressure Gauge: HPS Series907 / MKS
TM Pressure Control: MKS Series640
LL Pressure Gauge: HASTING
Configuration of Etch Chamber:
PM2:
Model of Chamber: 2300 Metal
Year of Construction: 2005
Model of Pressure Gauge: MKS, 0.1Torr
Model of Throttle Gate Valve: 65048-PH52-ADR1 VAT
Model of Turbo Pump: ATH2300M Alcatel
Model of TCP RF Generator: RFG / AE
Model of Bias RF Generator: APEX1513 / AE
Configuration of Etch Chamber:
PM3:
Model of Chamber: 2300 Metal
Year of Construction: 2005
Model of Pressure Gauge: MKS, 0.1Torr
Model of Throttle Gate Valve: 65048-PH52-ADR1 VAT
Model of Turbo Pump: ATH2300M Alcatel
Model of TCP RF Generator: RFG / AE
Model of Bias RF Generator: APEX1513 / AE
Configuration of MW Chamber:
PM1:
Model of Chamber: 2300 MWAVE STRPR
Year of Construction: 04-2006
Model of Pressure Gauge: MKS, Dual range
Model of Throttle Gate Valve: MKA, 253B-24836
Model of Vaporizer: MKS, WODMB-23398
Model of MW Generator: ASTEX, FI120160-3
Configuration of MFC: O2 5slm, N2 1slm
Configuration of MW Chamber:
PM4:
Model of Chamber: 2300 MWAVE STRPR
Year of Construction: 04-2006
Model of Pressure Gauge: MKS, Dual range
Model of Throttle Gate Valve: MKA, 253B-24836
Model of Vaporizer: MKS, WODMB-23398
Model of MW Generator: ASTEX, FI120160-3
Configuration of MFC: O2 5slm, N2 1slm
Configuration of Gas Panel, Etch Chamber:
Type of Gas Panel: IGS Bolck Type
No of Gas Channel: 8 Channel
Model of MFC: UFG8561
PM2:
BCL3 300sccm
N2 50sccm
Ar 500sccm
O2 1slm
CH4 50sccm
SF6 200sccm
Cl2 300sccm
CHF3 50sccm
PM3:
BCL3 301sccm
N2 51sccm
Ar 501sccm
O2 2slm
CH4 51sccm
SF6 201sccm
Cl2 301sccm
CHF3 51sccm
Gas Box 1.25C Seal Type
TMP Axiden ATH2300M
Micro Wave Power Gen MKS FI20160-3
RF Generator AE APEX-1513 and AE RFDS-1213
Chiller Unisem RCS 2500A
Power: 208VAC 3ph 4Wires 400AMPS 50/60Hz
2006 vintage.
LAM RESEARCH 2300 Kiyo is a revolutionary etcher / asher equipment designed for precision, reliability, and flexibility. This advanced etcher / asher system is designed to support devices of various sizes and configurations. Its architecture allows for accurate process control and repeatability when etching and ashing a wide range of substrate materials. 2300 Kiyo unit uses intelligent algorithms to calculate the optimum etch and ashing parameters for each substrate type, guaranteeing consistent results every time. It is designed to perform chemical mechanical planarization (CMP), chemical mechanical polishing (CMP), chemical etching (ISO etch), deep reactive ion etching (DRIE), and reactive ion etching (RIE) processes. Additionally, the machine is capable of precision backside cleaning. LAM RESEARCH 2300 Kiyo tool is equipped with several advanced features such as a gas flows analysis capability, temperature control over the pressure range, susceptor tuning, and a substrate temperature control mode. These features allow the operator to customize and adjust the asset to achieve the desired etching and ashing results. Moreover, with its integrated smart process controls, the model allows for automated tracking and adjustment of relevant process parameters, ultimately yielding reproducible results. 2300 Kiyo equipment also comes with intuitive software for easy system control and data collection. The GUI and software of the unit provide users with a complete etching and ashing environment that enables reproducible and reliable process performance. The machine also allows users to monitor and analyze the process data in real-time via direct, multi-site connection, enabling users to make informed decisions quickly. Overall, LAM RESEARCH 2300 Kiyo etcher / asher tool offers unparalleled reliability and performance for etching and ashing a wide range of substrates. Its advanced features and intuitive software provide an easy and efficient user experience, allowing users to achieve repeatable and consistent results every time. By combining these features and capabilities, 2300 Kiyo asset provides a comprehensive etching and ashing solution for semiconductor device fabrication.
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