Used LAM RESEARCH 2300 Kiyo #9302266 for sale
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ID: 9302266
Wafer Size: 12"
Vintage: 2008
Poly etcher, 12"
(4) Chambers
(3) FOUP load ports
RPDP AC Power box
Does not include system pumps or chillers
(16) Gas lines
IGS Gas boxes:
Gas line / Gas type / MFC Size
Gas 1 / SiCl4 / 100
Gas 2 / BCI3 / 300
Gas 3 / Cl2 / 300
Gas 4 / HBr / 500
Gas 5 / CF4 / 400
Gas 6 / O2 / 500
Gas 7 / O2 / 200
Gas 8 / He / 500
Gas 9 / H2 / 200
Gas 10 / CH2F2 / 200
Gas 11 / Ar / 1000
Gas 12 / 30% O2He / 50
Gas 13 / NF3 / 1000
Gas 14 / N2 / 250
Gas 15 / CHF3 / 300
Gas 16 / SO2 / 200
2008 vintage.
LAM RESEARCH 2300 Kiyo is a state-of-the-art plasma etcher/asher system designed for precise and reliable wafer processing. It is characterized by an innovative, compact design that optimizes the equipment footprint and allows for more precise movement and control. Its advanced capabilities are complemented by exceptional reliability and repeatability, which are delivered by a superior electrostatic field, precise scanning motions and precise gas flows for precise 360°, single-wafer etching. The powerful and advanced Kiyo features a patented arc detection mechanic (ADM) that gives process users precise control over etching processes and ensures excellent etch accuracy and uniformity. With this application-based control, users can adjust the applied gas flow and pressure for precise etch results that minimize the number of tool run cycles. Additionally, the Kiyo can deliver high etch performance on difficult-to-etch materials such as photoresists, tungsten, silicon, high-k dielectrics, and other materials. This is made possible by the application-specific wafer handling modules (WHMs), which provide precise motion and motion control with high-speed scanning. The Kiyo is also equipped with multiple throttle valves and mass flow controllers to enable precise gas control and uniform gas distribution over the wafer surface. This provides excellent repeatability, which is essential in applications such as MEMS and microprocessing. The Kiyo also includes a special feature that helps ensure the delivery of clean etch results - a patented pump system that helps evacuate air and byproducts before, during and after etching. In addition to its advanced features, the Kiyo is designed for ease of use, thanks to a graphical user interface (GUI). The GUI allows process engineers to easily set etch parameters, monitor tool performance and optimize process recipes for consistent and repeatable results. Further, the Kiyo is capable of transferring data to a USB drive and can even connect to a host PC for further data manipulation and control. Overall, 2300 Kiyo is an ideal etching solution that provides users with precise and repeatable results while also minimizing tool run times. Utilizing innovative motion control, precise gas flows and advanced features such as the pump system and application-specific WHMs, the Kiyo offers optimal etch performance for any application.
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