Used LAM RESEARCH 2300 Kiyo #9372748 for sale

LAM RESEARCH 2300 Kiyo
ID: 9372748
Wafer Size: 12"
Metal etcher, 12".
LAM RESEARCH 2300 Kiyo is a state of the art dry etcher/asher for processing semiconductor wafers. This equipment was designed for high precision, high throughput, and uniformity. The system's advanced plasma source technology and chamber design provide superior uniformity and homogeneity in etch rates. It is capable of producing high-quality dielectric etches and other thin films for cutting-edge technologies like MEMS and power electronics. The Kiyo utilizes RIE and RF MFR etching technologies for superior etching results. The electrical power generator maintains high level of throughput and high quality etching results during every etching cycle. A precision in-line metrology unit provides in-line real-time etch rate control and post process analysis to ensure that the etch result meets the desired specifications. The Kiyo includes a process reactor chamber which allows for uniformity and repeatability of plasma processes. The chamber is connected to the plasma generator which generates the radio frequency (RF) power necessary to operate the etching process. The machine also includes a wafer transfer station which allows the operator to load and unload the wafers for etching with manual or automatic loading. In addition to etching, the Kiyo also offers ashing capabilities. Ashing is a form of plasma cleaning that removes material from the surface of the wafer, including photoresist and other organic or inorganic contaminants. Ashing is a crucial part of many fabrication processes, and is utilized to create the protective plans needed for semiconductor devices. 2300 Kiyo is an efficient and reliable etcher/asher that provides ideal performance for the production of advanced semiconductor devices. Its precision in-line metrology and control tool allow for the highest level of accuracy for efficient manufacturing processes. The asset enables both batch and single wafer processing which provides flexibility for various user applications. The model is also capable of running complete process recipes from a single controller, providing cost-effective and efficient processing.
There are no reviews yet