Used LAM RESEARCH 2300 Metal45-CIP #9241984 for sale

LAM RESEARCH 2300 Metal45-CIP is an etcher / asher equipment designed to meet short process times and deliver uniformly etched patterns. It is built with the latest technological advances, delivering precise results. The system offers two main process technologies with the option of adding additional processes. It is equipped with a chemically-amplified photolithography (CAPL) that can etch patterns with an accuracy of +/- 0.001 microns. It also boasts an ALD (atomic layer deposition) option which is ideal for creating sub-micron patterns and uniform films. Additionally, the unit offers a chemical air-etching (CAE) option for etching tabs or other fine features into a design. The machine features a 45 cm × 45 cm, class-1 cleanroom compatible, elevator-type Inductively Coupled Plasma (ICP) source. It offers a fully automated wafer handling tool for precise and efficient wafer distribution, as well as uniform results across a variety of substrate materials such as aluminum, copper and various low-k materials. The ICP source also features a dual-gas delivery asset, allowing users to separate processing gases for results that minimize oxidation, carburation and binder burn. Additionally, the model includes a range of vacuum sources, including turbo-molecular, ion-getter and cryo pumps, ensuring the utmost cleanliness during processing. It features a vacuum tight load lock with a fast purge equipment, eliminating outgassing and particle ingestion. The system has a maximum temperature of 950°C and can accommodate up to 55 wafer carousels for easy and quick loading and unloading of multiple wafers. In a nutshell, 2300 Metal45-CIP is an advanced etcher / asher unit designed to meet high-performance requirements. It offers superior process accuracy and offers multiple technologies for precise and uniform results. With its safe, cleanroom compatible design, quick wafer handling machine and variety of vacuum sources, the tool ensures efficient and reliable results for an extensive range of substrates.