Used LAM RESEARCH 2300 Metal45-CIP #9241985 for sale

LAM RESEARCH 2300 Metal45-CIP etcher is a high-performance, multi-chamber, plasma-based equipment designed for etching processes in the semiconductor industry. It has a patented source-host modular architecture that provides flexibility and improves throughput for complex etching processes. The large chamber size of 400mm enables a capable system for performing high-volume device production as well as specialized wafer processing. Moreover, this unit offers high levels of functionality and process precision via substrate loading and unloading, multiple chamber configurations, and the ability to perform both isotropic and anisotropic etching. The Metal45-CIP is equipped with multi-frequency capacitively-coupled plasma (CCP) sources that span the frequency range of 100MHz to 2.45GHz. This wide frequency range enables the machine to etch multiple materials and layers with superior process control and uniformity due to the flexibility of adjusting the source power, temperature, and pressure. Additionally, the Metal45-CIP is capable of controlling the bias voltage of the substrate to reduce power RF at the susceptor. With this enhanced level of process control, semiconductor designers are able to achieve highly accurate control of doping, contact, and gate structures. The patented multiport source-host (MPSH) architecture of the Metal45-CIP allows for direct vertical entry of the gas sources, enabling rapid and efficient gas distribution and thus reducing gas puffing effects and improving etching uniformity. Additionally, the tool features a modular design that allows for the simultaneous operation of up to 3 chambers, enabling flexible asset configurations based on the application and process needs. Furthermore, the Metal45-CIP is equipped with advanced safety features such as mechanical interlocks for the source-host and pressure-leak detection model to protect personnel and facilitate safe operations. Additionally, it has advanced monitoring and diagnostic capabilities such as remote monitoring for increased productivity and equipment availability. In conclusion, 2300 Metal45-CIP etcher is an advanced, multi-chamber, plasma-based system for etching processes in the semiconductor industry. With its multiple chamber configurations, wide frequency range, modular MPSH architecture, and advanced safety features, the unit provides a high level of process control for efficient and reliable performance.