Used LAM RESEARCH 2300 V2 #293777560 for sale

LAM RESEARCH 2300 V2 is a high-performance etcher/asher used to remove material from a substrate in order to pattern electrical circuitry or etch sensitive materials. The etcher/asher is capable of operating with a mix of chemistries from relatively safe to highly corrosive and can process a wide variety of wafer sizes, ranging from 2-200 mm. The machine also provides automated substrate control and stable high-frequency module performance for repeatable processes. Its design features a robust duopole source that can be precisely aligned to deliver a consistent and uniform flux density across a substrate. The advanced processing capabilities of 2300 V2 are enabled through the high-performance RF generator, multi-zone gas distribution, and adaptive process system. The machine can operate with a variety of process gases, such as HF, O2F2, SF6, and Cl2, as well as reactant gas mixtures, making it suitable for etching and ashing applications across a wide range of etch rates and wafer sizes. The multi-zone gas distribution ensures uniform yet realistic anisotropic etching profiles, while the large chamber is designed to provide a stable environment for process time versus total thickness variation. LAM RESEARCH 2300 V2 is equipped with an easy-to-use touch screen interface, allowing users to quickly manage and monitor the etcher/asher's operation. The large, bright control panel displays operational parameters, including reaction extent and no-flow times, allowing for rapid diagnostics and prevention of potential patterning defects. It can also be remotely monitored and adjusted, allowing customers to maintain process consistency. The advanced process protection system ensures optimal device protection during plasma enhancement by ensuring that the conditions of the plasma are optimized to minimize damage to nearby areas. Overall, 2300 V2 is an advanced etcher/asher designed to provide customers with powerful and reliable processing capabilities, allowing them to handle a wide range of etching and etching/ashing applications with confidence.