Used LAM RESEARCH 2300 Versys Kiyo Poly #293758913 for sale

LAM RESEARCH 2300 Versys KIYO Poly is an asher and etcher used for thin film applications. It is a cutting-edge dry etching equipment designed for deep-level etching of both metals and polysilicon. The system has two available processes (transparent or self-limiting) which can be used for various etching techniques. The Versys KIYO Poly features two independent plasma sources which can be used independently for metal and polysilicon etching with precise control over both process steps. The plasma sources allow for high accuracy etch control and with no interference from the other plasma source. The unit also offers process flexibility that can be used for high-integrity etching of a variety of metal alloys (aluminum, titanium, tungsten, and others), and polysilicon materials including copper films as thin as 0.3 microns. The Versys KIYO Poly offers high precision process control with predictive etch rate control, temperature cut-off for uniform process performance, and Advanced Process Control (APC). It also offers a suite of versatile process options for both metal and polysilicon etching, including parameters for boron doping, trench etching, vertical step etching, and deep-level etching. The machine is capable of achieving critical dimension accuracy of +/- 1.0 micron and uniformity in submicron feature resolution. It offers an easy-to-use remote monitoring tool with real-time adjustments possible through the asset controls. The model is equipped with a high-temperature high vacuum (HTHV) chamber which provides a uniform etch rate for different film thickness and ensures process stability. It also features a precise dual-RF source equipment for ultimate control over the etch process and a fully automated electrode emission system. The Versys KIYO Poly is a versatile etch unit capable of achieving single-step etching of several devices in a single chamber, making it ideal for both prototype and production applications.