Used LAM RESEARCH 2300 Versys Kiyo #9137280 for sale

ID: 9137280
Wafer Size: 12"
Vintage: 2006
Etcher, 12" Mainframe: V2 (2) Kiyo (2) Strip 45 2006 vintage.
LAM RESEARCH 2300 Versys Kiyo is a high-tech etcher / asher that is ideal for applications ranging from advanced packaging and MEMS device fabrication to SOI substrate preparation. This powerful tool is able to etch in wet, dry, and plasma processes, making it a versatile option for various devices. It features a three-dimensional electromagnet for precise control of etching profiles, which makes it ideal for critical etching processes. In addition, the tool is equipped with a cryogen-free and vertical chiller equipment which allows for a high-speed, low-temperature etching process. The system is also designed with a high-efficiency filter unit, allowing for a clean, contaminant-free etching environment. The tool is able to etch a variety of materials and substrates, including gallium arsenide, silicon, noble metals, and more. It is able to etch materials with an extraordinary precision, ranging from 20 to 1,000 milling arcs for a range of depths. In addition, it is also equipped with a two-stage gas delivery machine, allowing for a variety of etch chemistries and reactive gases. The tool also features a high-precision step motor and a digital pattern generator that are easily programmable and allow for the production of any etching pattern required by the user. In addition, the tool is capable of etching 1D line, 2D circle, 3D multi-angle, and 4D complex shapes. Additionally, a laser alignment asset is included with the tool, allowing for further extreme accuracy. Furthermore, 2300 Versys Kiyo is designed with a load-lock chamber that allows for a suite of advanced sample handling capabilities. This model is designed with a high-efficiency bulk-etch configuration, which allows for a faster, more efficient process. Lastly, the tool also features a comprehensive monitoring equipment and is compliant with multiple standard plating protocols, making it perfect for various etching applications.
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