Used LAM RESEARCH 2300 Versys Kiyo #9152530 for sale
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ID: 9152530
Wafer Size: 12"
Vintage: 2009
Metal etcher, 12"
Loadport: SMIF (EFEM)
Metal core tool
Process chamber:
(2) Metal etchers
(2) MWAVE Strips
SMIF:
Signal tower: (3) Colors
(3) Load ports, 799-901175-004
ATM Robot, P/N: 151864
Buffer station: (25) Slots
Aligner
Transfer chamber:
Load lock: (2) LL / (4) Slot cool chambers
Model of transfer robot: Megatran7 / Brooks
Parts no. of rocker valve: (4) 853-007859-9223
TM Pressure gauge: HPS Series 907 / MKS
TM Pressure control: MKS Series 640
LL Pressure gauge: Hasting
Etch chamber:
PM2 & PM3:
pressure gauge: MKS, 0.1 Torr
Throttle gate valve: 65048-PH52-ADR1 / VAT
Turbo pump: ATH2300M / Alcatel
TCP RF generator: APEX2013 / AE
Bias RF generator: APEX1513 / AE
MW Chamber:
PM1 & PM4:
Model of chamber: 2300 MWAVE STRPR
Throttle gate valve: 65048-PH52-ADR1 / VAT
MW Generator: Revolution, 7690LAM-23
Configuration of MFC:
Ar 2SLM
O2 5SLM
N2 1SLM
Gas panel, etch chamber:
PM2:
Type of gas panel: 16-Line IGS gas box
Type: Block
16-Gas channels
MFC: SFC2480FAAPD2
Configuration of gas:
O2 20 SCCM
NF3 150/500 SCCM
CF4 60/200 SCCM
SF6 60/200 SCCM
HBr 30/100 SCCM
CH2F2 6/20 SCCM
SiCl4 20 SCCM
SiCl4 60/200 SCCM
CHF3 30/100 SCCM
Ar 150/500 SCCM
N2 60/200 SCCM
Cl2 15/50 SCCM
O2 150/500 SCCM
BCl3 50/200 SCCM
CF4 15/50 SCCM
Cl2 150/500 SCCM
PM3:
Type of gas panel: 16-Line IGS gas box
Type: Block
16-Gas channels
Model of MFC: SFC2480FAAPD2
Configuration of gas:
O2 20 SCCM
NF3 150/500 SCCM
CF4 60/200 SCCM
SF6 60/200 SCCM
HBr 30/100 SCCM
CH2F2 6/20 SCCM
SiCl4 20 SCCM
SiCl4 60/200 SCCM
CHF3 30/100 SCCM
Ar 150/500 SCCM
N2 60/200 SCCM
Cl2 15/50 SCCM
O2 150/500 SCCM
BCl3 50/200 SCCM
CF4 15/50 SCCM
Cl2 150/500 SCCM
Power: 208 VAC, 3 phase, 4 wires, 400 A, 50 / 60 Hz
2009 vintage.
LAM RESEARCH 2300 Versys Kiyo is a high-performance etcher/asher equipment designed for advanced applications. It offers advanced temperature control, precise pressure monitoring, and improved process flexibility. The Versys Kiyo can etch and asher a wide variety of substrates and materials, including both inorganic and organic materials. It features both ionized and non-ionized plasma modes for maximum process flexibility. The system is equipped with a proprietary digital image processing module that quickly and accurately sets the desired parameters and delivers consistent process results. In terms of chamber design, 2300 Versys Kiyo has a cylindrical reactor chamber with an overall diameter of 24 inches. The movable inner electrode is made of graphite and provides excellent uniformity and precise temperature control to the entire chamber. There is also a tube-mounted bellows that helps maintain constant gas pressure within the chamber and ensures reliable wafer uniformity. This unit is also equipped with a Cryo-pump, which enables the chamber to achieve a vacuum level of 10-6 torr. Additionally, the Versys Kiyo is the latest generation of LAM RESEARCH equipment to offer Fast Shutter Tooling. This advanced tooling technology allows the user to quickly shutter the chamber, even when less-than-optimal process conditions are present. The fast shutter also significantly reduces downtime, while still maintaining consistent process results. LAM RESEARCH 2300 Versys Kiyo is a comprehensive machine designed to provide flexible, dependable, and predictable performance. With its combination of accurate temperature control and reliable pressure monitoring, users can expect faster, repeatable process results. It comes with automated feature monitoring, predictive error detection, and a variety of support and maintenance tools. This tool is also compatible with various process recipes, allowing users to quickly select and modify the desired recipes. 2300 Versys Kiyo provides a safe and repeatable etching/ashing asset for high-end applications.
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